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Chemical Vapor Deposition of Gold

Published online by Cambridge University Press:  28 February 2011

Carl E. Larson ,
Thomas H. Baum  and
Robert L. Jackson
Carl E. Larson
Affiliation:
IBM Almaden Research Center, San Jose California 95120
Thomas H. Baum
Affiliation:
IBM Almaden Research Center, San Jose California 95120
Robert L. Jackson
Affiliation:
IBM Almaden Research Center, San Jose California 95120
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Abstract

Chemical vapor deposition of gold from dimethyl-2,4-pentandionato gold (III) and two fluorinated derivatives is reported. At substrate temperatures of 200–300°C, high purity gold films were obtained on SiO2 and Si substrates. Films with resistivities down to 1.3 times that of bulk gold were obtained at deposition temperatures of ∼200°C, where films with very small grain size could be deposited.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 721
Copyright
Copyright © Materials Research Society 1987

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