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Chemical Kinetics Models for Semiconductor Processing
Published online by Cambridge University Press: 10 February 2011
Abstract
Chemical reactions in the gas-phase and on surfaces are important in the deposition and etching of materials for microelectronic applications. A general software framework for describing homogeneous and heterogeneous reaction kinetics utilizing the Chemkin suite of codes is presented. Experimental, theoretical and modeling approaches to developing chemical reaction mechanisms are discussed. A number of TCAD application modules for simulating the chemically reacting flow in deposition and etching reactors have been developed and are also described.
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- Research Article
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- Copyright © Materials Research Society 1998
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