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Characterization of Ti Alloys Bombarded by keV Deuterium Ions

Published online by Cambridge University Press:  25 February 2011

G.P. Chambers
Affiliation:
Naval Research Laboratory, Washington D.C. 20375 D. Simons, NIST, Gaithersburg MD 20899
G. K. Hubler
Affiliation:
Naval Research Laboratory, Washington D.C. 20375 D. Simons, NIST, Gaithersburg MD 20899
J.A. Sprague
Affiliation:
Naval Research Laboratory, Washington D.C. 20375 D. Simons, NIST, Gaithersburg MD 20899
K.S. Grabowski
Affiliation:
Naval Research Laboratory, Washington D.C. 20375 D. Simons, NIST, Gaithersburg MD 20899
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Abstract

Thin Ti films have been bombarded at room temperature with 350–500 eV deuterium ions at current densities up to 0.5 mA/cm2. Analysis using scanning electron microscopy, x-ray diffraction, transmission electron microscopy, and secondary ion mass spectroscopy were carried out before and after bombardment. It was determined that deuterium diffuses rapidly throughout the Ti film, that the films were in a state of high compressive stress, and that the TiD2 phase was formed. No evidence of deuterium gas bubbles was found.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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