Hostname: page-component-8448b6f56d-mp689 Total loading time: 0 Render date: 2024-04-20T14:58:10.580Z Has data issue: false hasContentIssue false

Characterization of 4H <000-1> Silicon Carbide Films Grown by Solvent-Laser Heated Floating Zone

Published online by Cambridge University Press:  13 June 2012

Andrew A. Woodworth
Affiliation:
NASA Postdoctoral Program Fellow, NASA Glenn Research Center, 21000 Brookpark Road, MS 106-1, Cleveland, OH 44135, USA
Ali Sayir
Affiliation:
NASA Glenn Research Center, 21000 Brookpark Road, MS 106-1, Cleveland, OH 44135, USA
Philip G. Neudeck
Affiliation:
NASA Glenn Research Center, 21000 Brookpark Road, MS 77-1, Cleveland, OH 44135, USA
Balaji Raghothamachar
Affiliation:
Department of Materials Science & Engineering, Stony Brook University, Stony Brook, NY 11794-2275, USA
Michael Dudley
Affiliation:
Department of Materials Science & Engineering, Stony Brook University, Stony Brook, NY 11794-2275, USA
Get access

Abstract

Commercially available bulk silicon carbide (SiC) has a high number (>2000/cm2) of screw dislocations (SD) that have been linked to degradation of high-field power device electrical performance properties. Researchers at the NASA Glenn Research Center have proposed a method to mass-produce significantly higher quality bulk SiC. In order for this bulk growth method to become reality, growth of long single crystal SiC fibers must first be achieved. Therefore, a new growth method, Solvent-Laser Heated Floating Zone (Solvent-LHFZ), has been implemented. While some of the initial Solvent-LHFZ results have recently been reported, this paper focuses on further characterization of grown crystals and their growth fronts. To this end, secondary ion mass spectroscopy (SIMS) depth profiles, cross section analysis by focused ion beam (FIB) milling and mechanical polishing, and orientation and structural characterization by X-ray transmission Laue diffraction patterns and X-ray topography were used. Results paint a picture of a chaotic growth front, with Fe incorporation dependant on C concentration.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Neudeck, P. G. Huang, W. and Dudley, M.., Solid-State Elec., 42, 1257 (1998).Google Scholar
2. Zhang, J., Chung, G., Sanchez, E., Loboda, M. J., Sundaresan, S. and Singh, R. International Conference on Silicon Carbide and Related Materials, Cleveland, OH, September 11–16 (2011) (proceedings in press).Google Scholar
3. Berechman, R., chung, S., Soloviev, S. and Skowronski, M., International Conference on Silicon Carbide and Related Materials, Cleveland, OH, September 11–16 (2011) (proceedings in press).Google Scholar
4. Urakami, Y., Gunjishima, I., Yamaguchi, S., Kondo, H., Hirose, F., Adachi, A. and Onda, S., International Conference on Silicon Carbide and Related Materials, Cleveland, OH, September 1116, 2011 (proceedings in press).Google Scholar
5. Powell, J. A., Neudeck, P. G., Trunek, A. J. and Spry, D. J., U.S. Patent 7,449,065 issued November 11, 2008.Google Scholar
6. Burrus, C. A. and Stone, J, App. Phys. Lett., 26, 318320 (1975).Google Scholar
7. Griffiths, L. B. and Mlavsky, A. I., Electrochem. Soc., 111, 805 (1964)Google Scholar
8. Woodworth, A. A., et al. ., International Conference on Silicon Carbide and Related Materials, Cleveland, OH, September 1116, 2011 (proceedings in press).Google Scholar
9. Yoshikawa, T., Kawanishi, S. and Tanaka, T., Int. Conf. on Adv. Structure and Funct. Mater. Des., 2008, J. Phys.: Conf. Series 165 (2009) 012022 Google Scholar
10. Wahlin, H. B. and Knop, H. W., Phys. Rev., 74 (1948) 687 Google Scholar
11. Null, M.R. and Lozier, W.W., J. Appl. Phys., 29 (1958) 1605 Google Scholar
12. Huang, X. R., J. Appl. Cryst., 43, 926 (2010).Google Scholar
13. Dudley, M., Huang, X. R., Huang, W., Powell, A., Wang, S., Neudeck, P.G. and Skowronski, M., Appl. Phys. Lett., 75, 784, (1999).Google Scholar