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Characteristics of a phosphorus-doped p-type ZnO film by MBE

Published online by Cambridge University Press:  01 February 2011

Faxian Xiu ,
Zheng Yang ,
Mandalapu J. Leelaprasanna  and
Jianlin Liu
Faxian Xiu
Affiliation:
xiuf@ee.ucr.edu, University of California, Riverside, xxx, Riverside, CA, 92521, United States, 9518277723
Zheng Yang
Affiliation:
zyang@ee.ucr.edu
Mandalapu J. Leelaprasanna
Affiliation:
leela@ee.ucr.edu
Jianlin Liu
Affiliation:
jianlin@ee.ucr.edu
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Abstract

A solid-source GaP effusion cell was used to provide phosphorus dopants to achieve p-type ZnO with molecular-beam epitaxy (MBE). Room temperature (RT) Hall-effect measurements reveal that phosphorus-doped ZnO has a strong p-type conduction with a hole concentration of 6.5×1018 cm-3 and a hole mobility of 9.0 cm2/V s. X-ray diffraction measurements show a preferential growth orientation along <11-20> by θ-2θ scan and a tilt of ZnO (11-20) plane relative to the substrate surface by rocking curve and reciprocal space map. Photoluminescence (PL) spectra at 8.5 K show a dominant acceptor-bound exciton emission at 3.319 eV. The acceptor energy level of the phosphorus dopant is calculated to be 0.18 eV above the valence band from PL spectra, which is consistent with the temperature dependence of PL measurements.

Keywords

II-VIx-ray diffraction (XRD)electrical properties
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 892 , 2005 , 0892-FF18-09-EE09-09
Copyright
Copyright © Materials Research Society 2006

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References

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