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Applications of Optical Emission Spectroscopy to Semiconductor Processing
Published online by Cambridge University Press: 21 February 2011
Abstract
Optical emission spectroscopy (OES) has proven to be a valuable tool in the development and production of state-of-the-art semiconductor devices. Application to the plasma etching of a variety of materials necessary for integrated circuit fabrication is discussed, with particular emphasis placed on etch endpoint analysis. The utility of OES techniques in monitoring photolithographic processes is also presented.
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- Research Article
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- Copyright © Materials Research Society 1985
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