We report on the experimental investigation of the use of Sixtron Advanced Materials Silane-free gas generation system to deposit a transparent SiCxOy Na-diffusion barrier and anti-reflection film (for subsequent TCO thin film coatings) onto glass sheets with an APCVD deposition process. SiCxOy thin films (50-250nm thickness) with a tunable index of 1.65-1.75 are currently being deposited by APCVD On-line float glass coating systems depositing Transparent Conductive Oxide (TCO) coatings (both for Low-E windows and for solar panel manufacturing applications these coatings typically have a refractive index of about 1.9) using, for example, gaseous Silane (SiH4), Propylene or Ethylene and Oxygen. Such a barrier film is critical for achieving high transparency through its anti-reflection properties having an intermediate index, i.e. close to the value of to achieve high conductivity for subsequent deposited TCO layers and to improve the longevity of the TCO coating performance through its Na-diffusion barrier properties. The Sixtron's Silane-free gas generation system uses a solid material as starting source that is safe for shipping by airand thus removes many of the safety and cost concerns involved with handling and exchanging of hazardous Silane gas cylinders at the thin film production site. A successful transfer of this alternative Si-precursor material to the proprietary CVDgCoat™ APCVD coating platform under development by CVD Equipment corporation would enable the manufacturing and operation of safer and lower cost On-line and Off-line APCVD thin film glass coating systems for the fast growing coated glass sheet market driven by the growing alternative energy demand for both energy saving and energy generation materials.