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Analysis of plasma for carbon nanotube growth by plasma-enhanced chemical vapor deposition

Published online by Cambridge University Press:  26 February 2011

Atsushi Ozeki ,
Yoshiyuki Suda ,
Atsushi Okita ,
Junji Nakamura ,
Akinori Oda ,
Yosuke Sakai  and
Hirotake Sugawara
Atsushi Ozeki
Affiliation:
ozeki@mars-ei.eng.hokudai.ac.jp, Hokkaido University, Japan
Yoshiyuki Suda
Affiliation:
suda@ist.hokudai.ac.jp, Hokkaido University, Japan
Atsushi Okita
Affiliation:
okita@mars-ei.eng.hokudai.ac.jp, Hokkaido University, Japan
Junji Nakamura
Affiliation:
nakamura@ims.tsukuba.ac.jp, University of Tsukuba, Japan
Akinori Oda
Affiliation:
aknr.oda@nitech.ac.jp, Nagoya Institute of Technology, Japan
Yosuke Sakai
Affiliation:
sakaiy@ist.hokudai.ac.jp, Hokkaido University, Japan
Hirotake Sugawara
Affiliation:
sugawara@ist.hokudai.ac.jp, Hokkaido University, Japan
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Abstract

Optical emission spectra of a CH4/H2/Ar gas mixture plasma were observed during carbon nanotube (CNT) growth in RF plasma-enhanced chemical vapor deposition. CNTs with diameters of ∼10-30 nm and length of ∼6 μm were grown on double- and triple-layered films of catalyst/support materials (FexOy/TiO2 and Al2O3/FexOy/Al2O3) at the total gas pressures of 1-10 Torr with gas flow rates of CH4 = 27 sccm, H2 = 3 sccm, and Ar = 1 sccm. The number density of CNTs increased with the gas pressure, and Al2O3/FexOy/Al2O3 (each thickness of 1 nm) film yielded the thinnest CNTs with a high number density among the present catalysts. The spatial distributions of H atom relative density in the plasma were obtained by actinometry. The H relative density decreased with the pressure, and this suggests the suppression of CH3 radical generation in the plasma.

Keywords

plasma-enhanced CVD (PECVD) (deposition)nanostructurecatalytic
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Rb24-03
Copyright
Copyright © Materials Research Society 2006

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