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Analysis of Layered Structures at High Spatial Resolution Using Energy Filtered Imaging

Published online by Cambridge University Press:  10 February 2011

P.L. Flaitz  and
J. Bruley
P.L. Flaitz
Affiliation:
IBM Analytical Services, 1580 Route 52, Hopewell Junction, NY 12533
J. Bruley
Affiliation:
IBM Analytical Services, 1580 Route 52, Hopewell Junction, NY 12533
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Abstract

The development of energy filtered imaging systems for the TEM has opened new approaches to analyzing structures with very small dimensions. One of the benefits of such systems is the ability to form an EELS spectrum image containing energy information on one axis and spatial information on the other axis. By dissecting such an image in the spatial dimension, it is possible to generate a line profile across a layered structure at high spatial dimension without the need for a small probe. We have applied this approach to two structures typical of semiconductors, the Si/SiO2/Si interfaces in a gate oxide and the Ti/SiO2 interface for Al barrier metallization, which illustrate the spatial resolution possible with this technique. To analyze the spectrum images, the element specific near edge structure (ELNES) data are processed by conventional EELS background routines and multivariate statistical techniques using MATLAB software to extract both profiles of principal bonding components and composition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 523: Symposium U – Electron Microscopy of Semiconducting Materials & ULSI Devices , 1998 , 165
Copyright
Copyright © Materials Research Society 1998

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