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Amorphous Phase Formation in Solid State Reactions of Layered Nickel Zirconium Films

Published online by Cambridge University Press:  26 February 2011

Bruce M. Clemens  and
Jeffrey C. Buchholz
Bruce M. Clemens
Affiliation:
Physics Department, General Motors Research, Warren, Mi. 48094
Jeffrey C. Buchholz
Affiliation:
Physics Department, General Motors Research, Warren, Mi. 48094
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Abstract

Formation of an amorphous zirconium-nickel phase by solid state reaction of a layered crystalline structure has been studied by in-situ resistivity, x-ray diffraction, and Auger depth profiling. The reaction was studied as a function of layer thickness and reaction temperature.

Samples with a layer thickness of less than 4 atomic planes had x-ray diffraction spectra with one broad maximum characteristic of amorphous material. As the layer thickness increased, the maximum broadened and separated into two resolved peaks corresponding to crystalline nickel and zirconium. These structures were transformed to an amorphous nickel-zirconium alloy by an anneal at temperatures below the crystallization temperature of the amorphous phase. The reaction occured by a layer growth process, where the thickness of the layer evolved linearly with the square root of time.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 37: Symposium D – Layered Structures, Epitaxy, and Interfaces , 1984 , 559
Copyright
Copyright © Materials Research Society 1985

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