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AC and DC Polarization and Cyclic Voltammetric Behavior of Boron-Doped CVD Diamond IN 0.5M NaCl Solution

Published online by Cambridge University Press:  10 February 2011

R. Ramesham  and
M. F. Rose
R. Ramesham
Affiliation:
Space Power Institute, 231 Leach Center, Auburn University, Auburn, AL 36849–5320
M. F. Rose
Affiliation:
Space Power Institute, 231 Leach Center, Auburn University, Auburn, AL 36849–5320
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Abstract

Boron-doped diamond has been deposited over a Mo substrate by microwave plasma CVD using methane and hydrogen. Boron doping of diamond has been achieved in situ by using a solid boron source while growing the diamond. Impedance spectroscopy of diamond in 0.5 M NaCl solution has been studied. We have observed two time constants at the diamond/solution interface. Solution resistance was found to be constant irrespective of the electrode in the same electrolyte. DC polarization techniques such as linear and Tafel polarization have been used to evaluate the doped diamond/Mo and Mo for corrosion resistance characteristics interms of charge-transfer coefficients and corrosion rate. Cyclic voltammetry has been used to evaluate the doped diamond/Mo to study the background current response and the redox kinetics of ferri/ferrocyanide in 0.5M NaCl solution.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 451: Symposium P – Electrochemical Synthesis and Modification , 1996 , 561
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1. Natishan, P.M. and Morrish, A., Materials Letters, 8 (1989) 269.Google Scholar
2. Ramesham, R., Askew, R.F., Rose, M.F., Loo, B.H., J. Electrochem. Soc., 140 (1993) 3018.Google Scholar
3. Pleskov, Yu.V., Sakharova, A. Ya. and Krotova, M.D., Bouilov, L.L., and Spitsyn, B.V., J. Electroanal. Chem., 228 (1987) 19.Google Scholar
4. Tenne, R., Patel, K., Hashimoto, K., Fujishima, A., J. Electroanal. Chem., 347 (1993) 409.Google Scholar
5. Swain, G.M., J. Electrochem. Soc, 141 (1994) 3382.Google Scholar
6. Miller, B., Kalish, R., Feldman, L.C., Katz, A., Moriya, N., Short, K., and White, A.E., J. Electrochem. Soc, 141 (1994) L41.Google Scholar
7. Swain, G.M. and Ramesham, R., Anal. Chem., 65 (1993) 345.Google Scholar
8. Martin, H.B., Argoitia, A., Landau, U., Anderson, A.B., Angus, J.C., J. Electrochem. Soc, 143 (1996) L133.Google Scholar
9. Alehashem, S., Chambers, F., Strojek, J., Swain, G.M., and Ramesham, R., Anal. Chem. 67 (1995)2812.Google Scholar
10. Ramesham, R. and Rose, M.F., Thin Solid Films, Accepted Nov 1996.Google Scholar
11. Ramesham, R. and Rose, M.F., Diamond and Related Materials. Accepted Oct 1996.Google Scholar
12. Ramesham, R., Thin Solid Films, 229 (1993) 44.Google Scholar
13. Bard, A.J. and Faulkner, L.R., in Electrochemical Methods: Fundamentals and Applications, John Wiley & Sons, Inc., New York (1980).Google Scholar
14. Mansfeld, F., Kendig, M.W., and Tsai, S., Corrosion, 38 (1982) 478.Google Scholar