Skip to main content Accessibility help
×
Home
Hostname: page-component-79b67bcb76-vkbph Total loading time: 0.234 Render date: 2021-05-16T16:24:43.520Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true }

X-Ray Reflectometry Determination of Structural Information from Atomic Layer Deposition Nanometer-scale Hafnium Oxide Thin Films

Published online by Cambridge University Press:  01 February 2011

Donald Windover
Affiliation:
donald.windover@nist.gov, National Institute of Standards and Technology, Ceramics Division, 100 Bureau Drive, Gaithersburg, MD, 20899-8520, United States, 301-975-6102, 301-975-5334
D. L. Gil
Affiliation:
david.gil@coruscavi.com, Coruscavi Software, Washington, DC, 20037, United States
J. P. Cline
Affiliation:
jcline@nist.gov, National Institute of Standards and Technology, Ceramics Division, Gaithersburg, MD, 20899, United States
A Henins
Affiliation:
albert.henins@nist.gov, National Institute of Standards and Technology, Ceramics Division, Gaithersburg, MD, 20899, United States
N. Armstrong
Affiliation:
nicholas.armstrong@uts.edu.au, UTS, Department of Physics and Advanced Materials, Sydney, N/A, Australia
P. Y. Hung
Affiliation:
py.hung@sematech.org, SEMATECH, Austin, TX, 78741, United States
S. C. Song
Affiliation:
sc.song@sematech.org, SEMATECH, Austin, TX, 78741, United States
R. Jammy
Affiliation:
raj.jammy@sematech.org, SEMATECH, Austin, TX, 78741, United States
A. Diebold
Affiliation:
ADiebold@uamail.albany.edu, University at Albany, College of Nanoscale Science and Engineering, Albany, NY, 12203, United States
Get access

Abstract

This work demonstrates the application of a Markov Chain Monte Carlo (MCMC) approach to modeling X-ray reflectometry (XRR) data taken from a sub 10 nm Hafnium oxide film. We present here a comparison of two structural models for a 6 nm HfxOy atomic layer deposition (ALD) film on Si. Using the MCMC method and two distinct structural models, we show evidence of a thin interface between the HfxOy and Si layers with a density much higher than native SiO2. Results from genetic algorithm XRR analysis and thickness measurements using cross-sectional transmission electron microscopy are included for comparison. We also demonstrate that our interpretation of HfxOy thickness differs between the two structural models (i.e., total film thicknesses may be partially additive within each model).

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Pietsch, U., Holý, V., and Baumbach, T., High-resolution X-ray scattering: from thin films to lateral nanostructures. 2004, New York: Springer.CrossRefGoogle Scholar
2. Chason, E. and Mayer, T.M., Thin film and surface characterization by specular X-ray reflectivity. Critical Reviews in Solid State and Materials Sciences, 1997. 22(1): p. 1.CrossRefGoogle Scholar
3. Parratt, L.G., Surface studies of solids by total reflection of X-rays. Phys. Rev., 1954. 95: p. 359.CrossRefGoogle Scholar
4. Nevot, L. and Croce, P., Characterization of Surfaces by Grazing X-Ray Reflection - Application to Study of Polishing of Some Silicate-Glasses. Revue De Physique Appliquee, 1980. 15(3): p. 761.Google Scholar
5. Bowen, D.K. and Deslattes, R.D., X-ray metrology by diffraction and reflectivity. AIP Conference Proceedings, 2001. 550(550): p. 570.CrossRefGoogle Scholar
6. Wormington, M., et al., Characterization of structures from X-ray scattering data using genetic algorithms. Philosophical Transactions of the Royal Society of London Series a-Mathematical Physical and Engineering Sciences, 1999. 357(1761): p. 2827.CrossRefGoogle Scholar
7. Sivia, D.S., Data Analysis A Bayesian Tutorial. 1996, Oxford: Oxford University Press.Google Scholar
8. Wallace, R.M. and Wilk, G.D., High-kappa dielectric materials for microelectronics. Critical Reviews in Solid State and Materials Sciences, 2003. 28(4): p. 231.CrossRefGoogle Scholar
9. Windover, D., et al., Characterization of atomic layer deposition using X-ray reflectometry. AIP Conference Proceedings, 2005. 788(788): p. 161.CrossRefGoogle Scholar
10. Fishman, G.S., Monte Carlo concepts, algorithms and applications. 1996, New York: Springer-Verlag.Google Scholar
11. Taylor, B.N. and Kuyatt, C.E., Guidelines for evaluating and expressing the uncertainty of NIST measurement results. 1994 ed. NIST Technical Note 1297. 1994, Gaithersburg, MD: National Institute of Standards and Technology, U.S. Department of Commerce.CrossRefGoogle Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

X-Ray Reflectometry Determination of Structural Information from Atomic Layer Deposition Nanometer-scale Hafnium Oxide Thin Films
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

X-Ray Reflectometry Determination of Structural Information from Atomic Layer Deposition Nanometer-scale Hafnium Oxide Thin Films
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

X-Ray Reflectometry Determination of Structural Information from Atomic Layer Deposition Nanometer-scale Hafnium Oxide Thin Films
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *