Hostname: page-component-76fb5796d-r6qrq Total loading time: 0 Render date: 2024-04-25T07:37:22.574Z Has data issue: false hasContentIssue false

Transparent, high refractive index oxides: Control of the nanostructure of titanium hafnium oxide alloys by variation of the ion energy during reactive magnetron sputtering deposition

Published online by Cambridge University Press:  08 June 2015

Juan J. Díaz León
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
Matthew P. Garrett
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
David M. Fryauf
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
Junce Zhang
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
Kate J. Norris
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
Sharka M. Prokes
Affiliation:
Code 6786, Naval Research Laboratory, Washington, DC (USA)
Nobuhiko P. Kobayashi
Affiliation:
Baskin School of Engineering, University of California Santa Cruz Santa Cruz, California, U.S.A. Nanostructured Energy Conversion Technology and Research (NECTAR) Advanced Studies Laboratories, University of California Santa Cruz and NASA Ames Research Center, Moffett Field, California, U.S.A.
Get access

Abstract

A range of optical and optoelectronic applications would benefit from high refractive index (n), dense and transparent films that guide, concentrate and couple light. However, materials with high n usually have a high optical extinction coefficient (κ) which keeps these materials from being suitable for optical components that require long optical paths. We studied titanium hafnium oxide alloy films to obtain high refractive index (n>2) with minimum optical extinction coefficients (κ < 10−5) over the visible and near IR spectrum (380-930 nm). Titanium hafnium oxide alloys were deposited using pulsed DC reactive magnetron sputtering with and without RF substrate bias on silicon dioxide. For a given deposition condition intended for a specific titanium/hafnium molar fraction ratio, the ion energy of deposition species was explicitly controlled by varying the RF substrate bias. Spectroscopic ellipsometry, transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDS) and atomic force microscopy (AFM) were used to characterize the films. It appears that applying RF substrate bias reduces the nanocrystalline size, changes the surface morphology and increases the refractive index while maintaining comparable titanium/hafnium cation molar fraction. Precise control of the nanostructure of ternary metal oxides can alter their macroscopic properties, resulting in improved optical films.

Type
Articles
Copyright
Copyright © Materials Research Society 2015 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Hosono, H. in Handbook of Transparent Conductors (eds. Ginley, D. S. & Perkins, J. D.) 459587 (Springer US, 2011). doi:10.1007/978-1-4419-1638-9.CrossRefGoogle Scholar
Diaz Leon, J. J., Garrett, M. P., Zhang, J. & Kobayashi, N. P. Aluminum titanium oxide alloys : Deposition of amorphous, transparent, corrosion-resistant films by pulsed DC reactive magnetron sputtering with RF substrate bias. Mater. Sci. Semicond. Process. 36, 96102 (2015).CrossRefGoogle Scholar
Biluš Abaffy, N., McCulloch, D. G., Partridge, J. G., Evans, P. J. & Triani, G. Engineering titanium and aluminum oxide composites using atomic layer deposition. J. Appl. Phys. 110, 123514 (2011).CrossRefGoogle Scholar
Kim, D. Low temperature deposition of ITO on organic films by using negative ion assisted dual magnetron sputtering system. Vacuum 81, 279284 (2006).CrossRefGoogle Scholar
Fang, Q. et al. Investigation of TiO 2 -doped HfO 2 thin films deposited by photo-CVD. Thin Solid Films 428, 263268 (2003).CrossRefGoogle Scholar
Peacock, P. W. & Robertson, J. Band offsets and Schottky barrier heights of high dielectric constant oxides. J. Appl. Phys. 92, 4712 (2002).CrossRefGoogle Scholar
Chen, F. et al. A study of mixtures of HfO2 and TiO2 as high-k gate dielectrics. Microelectron. Eng. 72, 263266 (2004).CrossRefGoogle Scholar
Von Lim, Y., Wong, T. I. & Wang, S. Electronic structure and crystallinity of the HfO2–TiO2 thin films. Thin Solid Films 518, e107e110 (2010).CrossRefGoogle Scholar
Cisneros-Morales, M. C. & Aita, C. R. Optical absorption at its onset in sputter deposited hafnia-titania nanolaminates. J. Appl. Phys. 108, (2010).CrossRefGoogle Scholar
Kobayashi, N. P. et al. Titanium hafnium oxide alloy films by a novel sub-atomic layer sputtering process for high index and graded index applications. in MRS Online Proceedings Library 1565 (2013).Google Scholar
Martin, P. J. Ion-based methods for optical thin film deposition. Journal of Materials Science 21, 125 (1986).CrossRefGoogle Scholar
Martinu, L. et al. Advances in Optical Coatings Stimulated by the Development of Deposition Techniques and the Control of Ion Bombardment. SVC Bull. (2014).Google Scholar
Amin, a, Köhl, D. & Wuttig, M. The role of energetic ion bombardment during growth of TiO 2 thin films by reactive sputtering. J. Phys. D. Appl. Phys. 43, 405303 (2010).CrossRefGoogle Scholar
Hultman, L. Low-energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure. J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 9, 434 (1991).CrossRefGoogle Scholar
Musil, J., Šícha, J., Heřman, D. & Čerstvý, R. Role of energy in low-temperature high-rate formation of hydrophilic TiO[sub 2] thin films using pulsed magnetron sputtering. J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 25, 666 (2007).CrossRefGoogle Scholar
Nečas, D. & Klapetek, P. Gwyddion: an open-source software for SPM data analysis. Centr. Eur. J. Phys 10, 181188 (2012).Google Scholar
Ebert, J. Activated reactive evaporation. SPIE 325, 2938 (1982).Google Scholar
Elert, G. The physics hypertextbook. (2006).Google Scholar