Skip to main content Accessibility help
×
Home
Hostname: page-component-5c569c448b-w5x57 Total loading time: 0.245 Render date: 2022-07-02T12:36:48.049Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "useRatesEcommerce": false, "useNewApi": true } hasContentIssue true

Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces

Published online by Cambridge University Press:  01 February 2011

Chun-Li Liu
Affiliation:
Advanced Process Development and External Research Laboratory, Motorola, Mesa, AZ 85202
Matt Stoker
Affiliation:
Advanced Process Development and External Research Laboratory, Motorola, Mesa, AZ 85202
Rama I. Hegde
Affiliation:
Advanced Process Development and External Research Laboratory, Motorola, Mesa, AZ 85202
Raghaw S. Rai
Affiliation:
Advanced Process Development and External Research Laboratory, Motorola, Mesa, AZ 85202
Philip J. Tobin
Affiliation:
Advanced Process Development and External Research Laboratory, Motorola, Mesa, AZ 85202
Get access

Abstract

The assessment of the thermal stability across HfO2/Si and HfO2/SiO2 interfaces has been difficult due to lack of thermodynamic data. In this paper, we present the results of thermodynamic calculations intended to fill this gap. A thermodynamic model was developed by assuming that HfSiO4 is an ideal solution of HfO2 and SiO2 to a first order approximation. The theoretical results predict that the HfO2/Si interface is thermodynamically stable up to 1100°C, while the HfO2/SiO2 interface is thermodynamically unstable even at room temperature. Our experimental results from TEM and XPS analysis are consistent with these modeling predictions.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Wilk, G. D., Wallace, R. M., and Anthony, J. M., J. of Applied Physics, 89 (2001), p. 5243.CrossRefGoogle Scholar
2. Hubbard, K. J. and Schlom, D. G., J. of Materials Research, 11(1996), p. 2757.CrossRefGoogle Scholar
3. Bobinson, G. R., Hass, J. L., American Mineralogist, 68 (1983) 541553.Google Scholar
4. Kieffer, S. W., Reviews of Geophysics and Space Physics, 17(1979) 1.CrossRefGoogle Scholar
5. Kieffer, S. W., Reviews of Geophysics and Space Physics, 17(1979) 20.CrossRefGoogle Scholar
6. Kieffer, S. W., Reviews of Geophysics and Space Physics, 17(1979) 35.CrossRefGoogle Scholar
7. Kieffer, S. W., Reviews of Geophysics and Space Physics, 18(1980) 862.CrossRefGoogle Scholar
8. Benson, S. W., Thermochemical Kinetics, New York, Wiley, 1976.Google Scholar
9. Barin, I., Thermodchemical Data of Pure Substances, VCH Verlags Gesellschaft, Weinheim, 1989.Google Scholar
10. Meschel, S. V. and Kleppa, O. J., J. of Alloys and Compounds, 280 (1998) 231239.CrossRefGoogle Scholar
11. Topor, L. and Kleppa, O. J., J. of Less-Common Metals, 167(1990) 9199.CrossRefGoogle Scholar

Save article to Kindle

To save this article to your Kindle, first ensure coreplatform@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces
Available formats
×

Save article to Dropbox

To save this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Dropbox account. Find out more about saving content to Dropbox.

Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces
Available formats
×

Save article to Google Drive

To save this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Google Drive account. Find out more about saving content to Google Drive.

Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *