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Temperature study of CVD graphene on Cu thin films: competition between C catalysis and Cu dewetting

Published online by Cambridge University Press:  22 May 2014

G. Amato
Affiliation:
The Quantum Research Laboratory, INRIM, strada delle Cacce 91, I-10135, Torino, Italy.
L. Croin
Affiliation:
The Quantum Research Laboratory, INRIM, strada delle Cacce 91, I-10135, Torino, Italy. Dept. of Applied Science and Technology, Polytechnic of Turin, Corso Duca degli Abruzzi 24, I-10129, Torino, Italy.
G. Milano
Affiliation:
Physics Dept. and NIS center, University of Turin, Via Pietro Giuria 1, I-10125, Torino, Italy.
E. Vittone
Affiliation:
Physics Dept. and NIS center, University of Turin, Via Pietro Giuria 1, I-10125, Torino, Italy.
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Abstract

In this paper we report on a systematic study of Cu thin film dewetting by the monitoring of the intensity of the infra-red emission from the film surface during Rapid Thermal Chemical Vapor Deposition of graphene. The time evolution of Cu coverage highlights three typical stages of dewetting which strongly depend not only on the temperature and film thickness, but also on the pressure and composition of the gas in chamber. Consequently, we demonstrate that the Cu surface can be effectively activated in films at temperatures lower than in foils and the process can be fully controlled by adjusting those parameters, in order to reach the optimal conditions for graphene growth.

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Copyright
Copyright © Materials Research Society 2014 

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