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Surface Deformation of Metal Films Under Controlled Pressure for Generating Ultra-flat Metal Surfaces

Published online by Cambridge University Press:  01 February 2011

Logeeswaran Vj
Affiliation:
lvjay@ucdavis.edu, University of California-Davis, Electrical & Computer Engineering, Kemper Hall,, One Shields Ave, DAVIS, CA, 95616, United States
Mei-Lin Chan
Affiliation:
cmlchan@ucdavis.edu, University of California-Davis, Mechanical & Aeronautical Engineering, Bainer Hall,, One Shields Ave, DAVIS, CA, 95616, United States
M.Saif Islam
Affiliation:
sislam@ucdavis.edu, University of California-Davis, Electrical & Computer Engineering, Kemper Hall,, One Shields Ave, DAVIS, CA, 95616, United States
David A. Horsley
Affiliation:
dahorsley@ucdavis.edu, University of California-Davis, Mechanical & Aeronautical Engineering, Bainer Hall,, One Shields Ave, DAVIS, CA, 95616, United States
Wei Wu
Affiliation:
wei.wu@hp.com, Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
Shih Yuan Wang
Affiliation:
sywang@hp.com, Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
R. Stanley Williams
Affiliation:
stan@hp.com, Hewlett Packard Laboratories, Quantum Science Research Advanced Studies, 1501 Page Mill Road,, Palo Alto, CA, 94304, United States
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Abstract

We present a technique to generate ultra-smooth surfaces and direct pattern imprinting on thin metal films by flattening the bumps and spikes of a freshly vacuum deposited metal film. The technique was implemented by using a small footprint mechanical imprint press that has the capability to vary the applied pressure from 100MPa to 600MPa. The mechanical press was incorporated with a tactile force sensor that enabled direct monitoring of the applied pressure. We demonstrated the feasibility of the technique on an e-beam evaporated silver (Ag) metal film with thickness ranging from 150Å (optically thin) to 1000Å (optically thick). The film was deposited on double-polished (100)-oriented silicon surface and double-polished borosilicate glass, resulting in a varying degree of film smoothness. The surface morphology of the pressed thin film was then studied using atomic force microscopy and SEM. Our demonstration with the e-beam evaporated silver thin film exhibits the potential for applications in decreasing the scattering-induced losses in optical metamaterials, plasmonic nanodevices and electrical shorts in molecular-scale electronic devices.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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References

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