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Size-controlled deposition of Ag and Si nanoparticle structures with gas-aggregated sputtering

Published online by Cambridge University Press:  21 May 2013

Cathal Cassidy
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Vidyadhar Singh
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Zafer Hawash
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Murtaza Bohra
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Jeong-Hwan Kim
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
Mukhles Sowwan
Affiliation:
Okinawa Institute of Science and Technology (OIST), 1919-1 Tancha, Onna-son, 904-0495, Japan
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Abstract

Physical vapor deposition, in combination with gas-aggregation (PVD-GA), is a controllable method for creation of diverse nanoparticle structures. Given the size effects that dominate the physics of nanoparticles, a particular advantage of the PVD-GA technique is the compatibility with in situ mass filtering of the nanocluster beam.

In the current work, PVD-GA has been utilized to deposit Ag and Si nanoparticles. Nanoparticles were analyzed using in situ quadrupole mass spectrometry (charge/mass ratio), atomic force microscopy (nanoparticle height), and transmission electron microscopy (nanocluster diameter & crystallinity). The results for particle size distribution were cross-correlated, with excellent agreement.

Different growth methods & conditions were explored, resulting in controlled differences in the measured particle size distributions and surface coverage. A novel growth configuration utilizing a conventional sputter source in combination with a linear magnetron allowed a significant (fivefold) increase in Ag cluster yield.

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Copyright
Copyright © Materials Research Society 2013 

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Size-controlled deposition of Ag and Si nanoparticle structures with gas-aggregated sputtering
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