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Simultaneous Effects on Topography, Composition and Texture in Ion Assisted Deposition of Thin Films

Published online by Cambridge University Press:  01 February 2011

James M.E. Harper
James M.E. Harper*
Affiliation:
Department of Physics, University of New Hampshire Durham, NH 03824
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Abstract

Ion bombardment during deposition may simultaneously affect thin film topography, composition and crystallographic texture. Ion etching can produce periodic ripples that depend on the angle of ion incidence and surface temperature. When applied during deposition, ion bombardment can produce in-plane crystallographic orientation in polycrystalline materials for specific angles of incidence. In addition, ion bombardment changes the composition of multicomponent thin films according to the local angles of ion incidence and ion/atom ratios. Therefore, these three mechanisms may be linked under certain deposition conditions to generate novel topographically patterned materials with locally controlled composition and texture. Examples include metal alloys, oxides and nitrides, and recommendations for specific nanoscale structures are given.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 843: Symposium T – Surface Engineering-Fundamentals and Applications , 2004 , T5.1
Copyright
Copyright © Materials Research Society 2005

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References

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