Skip to main content Accessibility help
×
Home
Hostname: page-component-568f69f84b-gcfkn Total loading time: 0.186 Render date: 2021-09-19T02:11:46.016Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true, "newUsageEvents": true }

Pzt Interaction with Metal and Oxides Studied by Rutherford Backscattering Spectrometry

Published online by Cambridge University Press:  25 February 2011

Peter Revesz
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Jian Li
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
Nicholas Szabo Jr
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
James W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
David Caudillo
Affiliation:
National Semiconductor, M/S E 140, 2900 Semiconductor Drive, Santa Clara, CA 95052
Edward R. Myers
Affiliation:
National Semiconductor, M/S E 140, 2900 Semiconductor Drive, Santa Clara, CA 95052
Get access

Abstract

Annealing behavior in oxygen ambients of the of the ferroelectric PZT on Hf and Zr electrodes has been studied in the temperature range of 500-800°C using the 3.045MeV O16(∝,∝)O16 resonance in backscattering spectrometry. Internal oxidation of the buried metal electrode was observed. Oxygen concentration of the PZT film decreases with increasing temperature. Pb loss of the PZT film occurred above 700°C.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Krishnakumar, S., Esener, S.C., Fan, C., Ozguz, H.V., Title, M.A., Cozzolino, C. and Lee, S.L. in Ferroelectric Thin Films, edited by Myers, E.R. and Kingon, A.I. (Mater. Res. Soc Proc. 200 Pittsburgh, PA 1990. pp 9196.Google Scholar
[2]Parikh, N.A., Stepen, J.T., Swanson, M.L. andMyers, E.R., Ferroelectric Thin Films, edited by Myers, E.R. and Kingon, A.I. (Mater. Res. Soc Proc. 200 Pittsburgh, PA 1990. 193196.Google Scholar
[3]Sreenivas, K., Sayer, M., Laursen, T., Whitton, J.L., Pasqual, R., Johnson, D.j., Amm, D.T., Sproule, G.I., Mitchell, D.F., GrahamS, M.J..Gujrathy, C. andOxom, K., Ferroelectric Thin Films, edited by Myers, E.R. and Kingon, A.I. (Mater. Res. Soc Proc. 200 Pittsburgh, PA 1990. 255260.Google Scholar
[4] Dey, S.K. andZuleeg, R., Ferroeletrics, 108, 37, (1990)CrossRefGoogle Scholar
[5]Blanpain, B., Revesz, P., Doolittle, L.R., Purser, K.H. andMayer, J.W., Nucl. Instr. and Meth. B34, 459, (1988)CrossRefGoogle Scholar
[6]Li, J., Matienzo, L.J., Revesz, P., Vizkelethy, G., Wang, S.Q., Kaufnarn, J.J. and Mayer, J.W., Nucl. Instr. and Meth. B46, 287, (1990)Google Scholar
[7]Li, J., Vizkelethy, G., Revesz, P. and Mayer, J.W., Nucl. Instr. and Meth. B to be publishedGoogle Scholar
[8]Wang, S.Q. and Mayer, J.W., J. Appl.Phys. 64 (9), p 4711. (1988)CrossRefGoogle Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Pzt Interaction with Metal and Oxides Studied by Rutherford Backscattering Spectrometry
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Pzt Interaction with Metal and Oxides Studied by Rutherford Backscattering Spectrometry
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Pzt Interaction with Metal and Oxides Studied by Rutherford Backscattering Spectrometry
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *