Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-17T07:21:44.742Z Has data issue: false hasContentIssue false
  • English
  • Français

Plasma Oxidation of Y-Ba-Cu-O Precursor Filaments

Published online by Cambridge University Press:  16 February 2011

J. D. Klein ,
J. P. Hachey  and
A. Yen
J. D. Klein
Affiliation:
EIC Laboratories, Norwood, MA 02062
J. P. Hachey
Affiliation:
EIC Laboratories, Norwood, MA 02062
A. Yen
Affiliation:
EIC Laboratories, Norwood, MA 02062
Get access

Abstract

YBa2Cu3O7 filaments produced from a soluble molecular precursor were reacted using low pressure oxygen heat treatments with and without an applied plasma. Filaments reacted at temperatures between 750 and 800°C with the aid of an oxygen plasma were found to have higher transition temperatures than those reacted under similar conditions without a plasma. The highest zero resistance critical temperature, Tc(0) = 91.6 K, was obtained from a filament reacted in a 0.2 Torr oxygen plasma at 800°C. At the lowest reaction plasma temperature of 700°C a Tc(0) of 88.0 K was observed. X-ray diffraction revealed that filaments reacted at an oxygen pressure of 1 atm were nearly tetragonal while those reacted at 0.2 Torr, with or without a plasma, were quite orthorhombic.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 223: Symposium E – Low Energy Ion Beam and Plasma Modification of Materials , 1991 , 165
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Eom, C.B., Sun, J.Z., Yamamoto, K., Marshall, A.F., Luther, K.E., Geballe, T.H., and Laderman, S.S., Appl. Phys. Lett. 55, 595 (1989).Google Scholar
2. Fujita, J., Yoshitake, T., Kamijo, A., Satoh, T., and Igarashi, H., J. Appl. Phys. 64, 1292 (1988).Google Scholar
3. Klein, J.D., Yen, A., and Clauson, S.L., Appl. Phys. Lett., 56 394 (1990).Google Scholar
4. Klein, J.D., Yen, A., and Clauson, S.L., J. Appl. Phys. 67, 6389 (1990).Google Scholar
5. Ying, Q.Y., Shaw, D.T., and Kwok, H.S., Appl. Phys. Lett. 5, 1762 (1988).Google Scholar
6. Deshmukh, S., Rothe, Erhard W., Reck, G.P., Kushida, T., and Xu, Z.G., Appl. Phys. Lett.,53 2698 (1988).Google Scholar
7. Mogro-Campero, A. and Turner, L.G., Appl. Phys. Lett. 58, 417 (1991).Google Scholar
8. Kumagai, T., Manabe, T., Kondo, W., Minamiue, H., and Mizuta, S., Jpn. J. Appl. Phys. 29, L940 (1990).Google Scholar
9. Kumagai, T., Manabe, T., Kondo, W., and Mizuta, S., Jpn. J. Appl. Phys. 30, L28 (1991).Google Scholar
10. Rupich, M.W., Lagos, B., and Hachey, J.P., Appl. Phys. Lett. 55, 2447 (1989).Google Scholar
11. Rupich, M.W., Cogan, S.F., Lagos, B., and Hachey, J.P. in High-Temperature Superconductors: Fundamental Properties and Novel Materials Processing edited by Christen, D., Narayan, J., and Schneemeyer, L. (Mater. Res. Soc. Proc. 169, Pittsburgh, PA 1990) pp.1209–1212.Google Scholar
12. Lindemer, T.B., Hunley, J.F., Gates, J.E., Sutton, A.L., Brynestad, J., and Hubbard, C.R., J. Am. Ceram. Soc. 22, 1775 (1989).Google Scholar