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Pb Electrodeposition in the Presence of Chlorine Ions on Cu(100): An in Situ Optical Reflectivity Difference Study

Published online by Cambridge University Press:  15 February 2011

J. Gray
Department of Physics, University of California, Davis, CA 95616, U.S.A.
W. Schwarzacher
H.H. Wills Physics Laboratory, Tyndall Avenue Bristol BS8 1TL, U.K.
X.D. Zhu
Department of Physics, University of California, Davis, CA 95616, U.S.A.
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We studied the initial stages of the electrodeposition of Pb in the presence of chlorine ions on Cu(100), using an oblique-incidence optical reflectivity difference (OIRD) technique. The OI-RD results reveal that immediately following the underpotential deposition (UPD) of the first Pb monolayer, two different types of bulk-phase films grow depending upon the magnitude of overpotential and cyclic voltammetry (CV) scan rate. At low overpotentials and/or slow scan rates, we propose that a bulk-phase Pb film grows on top of the UPD monolayer. At high overpotentials and/or fast scan rates, either a PbO, PbCl2, or a rough Pb bulk-phase layer grows on top of the UPD layer such that the reflectivity difference signal from such a film has an opposite sign.

Research Article
Copyright © Materials Research Society 2003

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