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Microstructure of BaTiO3 Thin Films Grown by Reduced-Pressure CVD

Published online by Cambridge University Press:  25 February 2011

Peter C. Van Buskirk
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
Robin Gardiner
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
Peter S Kirlin
Affiliation:
Advanced Technology Materials, 520-B Danbury Road, New Milford, CT. 06776
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Abstract

Polcrystalline BaTiO3 films have been grown on NdGaO3 [100], SrTiO3 [100] and Si [100] substrates by reduced pressure CVD. The substrate temperature was 1000°C and the total pressure during growth was 4 torr. X-ray diffraction measurements indicate highly textured films on the NdGa03 substrate. The orientation was predominantly [100], accompanied by small quantities of various TiO crystalline phases.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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