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Microstructure Dependence of Hydrogen Sensing Properties of Palladium Functionalized Tungsten Oxide Films

Published online by Cambridge University Press:  09 January 2012

Meng Zhao
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, P.R.C. Department of Electronic Science and Technology, Changzhou University, Changzhou, P.R.C.
Jian-Xing Huang
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, P.R.C.
Chung-Wo Ong
Affiliation:
Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, P.R.C.
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Abstract

Tungsten oxide (WO3) films were prepared by using magnetron sputtering. Substrate temperature and sputtering pressure were adjusted to vary the microstructure. The films were found to contain nanoclusters; while their size L, and porosity θ and surface roughness zRMS of the film can be varied. After adding a palladium coating on the film surface, the hydrogen (H2) sensing properties of the films, including sensitivity of detection, response time and recovery time were measured. Their dependences on L, θ and zRMS were analyzed and interpreted. The information achieved is useful for improving H2 sensor technology.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

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Microstructure Dependence of Hydrogen Sensing Properties of Palladium Functionalized Tungsten Oxide Films
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