Skip to main content Accessibility help
×
Home
Hostname: page-component-544b6db54f-8tjh8 Total loading time: 0.239 Render date: 2021-10-22T13:32:01.165Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true, "newUsageEvents": true }

Low Resistivity Transparent Indium Tin Oxide (Ito) Films Sputtered At Room Temperature With H2O Addition

Published online by Cambridge University Press:  10 February 2011

Ken-Ichi Onisawa
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd. 7-1-1 Omika-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan
Etsuko Nishimura
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd. 7-1-1 Omika-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan
Masahiko Ando
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd. 7-1-1 Omika-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan
Takeshi Satou
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd. 7-1-1 Omika-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan
Masaru Takabatake*
Affiliation:
Electron Tube & Devices Division, Hitachi, Ltd. 3300 Hayano, Mobara-shi, Chiba-ken, 297, Japan
Tetsuroh Minemura
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd. 7-1-1 Omika-cho, Hitachi-shi, Ibaraki-ken, 319-12, Japan
Get access

Abstract

A new kind of amorphous indium tin oxide (ITO) film with good pattern delineation properties and mass production capability, as well as low resistivity and high transparency has been developed. The film was prepared by a cluster-type DC magnetron sputtering apparatus at room temperature with H2O addition to the argon sputtering gas. The amorphous ITO film quality was improved by effective termination of oxygen vacancies with -OH species generated by enhanced decomposition from the added H2O in the plasma.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Ishibashi, S., Higuchi, Y., Ota, Y., and Nakamura, K., J. Vac. Sci. Technol. A8, 1399 (1990).CrossRefGoogle Scholar
2. Kitahara, H., Uchida, T., Atsumi, M., Kaida, Y., and Ichikawa, K., Proc. 1st Int. Symp. on Sputtering and Plasma Processes, Tokyo, 1991, p. 149.Google Scholar
3. Ando, M., Takabatake, M., Nishimura, E., Leblanc, F., Onisawa, K., Minemura, T., Proc. 16th Int. Conf. of Amorphous Semiconductors, Kobe, 1995, p.385; also to be published in J. Noncrystalline Solids, 1996.Google Scholar
4. Nishimura, E., Ando, M., Onisawa, K., Takabatake, M., Minemura, T., to be published in Jap. J. Appl. Phys. May(1996).Google Scholar
5. Kostlin, H., Jost, R., and Lems, W., Phys. Status Solidi (a)29 (1975)87.CrossRefGoogle Scholar
6. Bellingham, J. R., Philips, W. A., and Adkins, C. J., Thin Solid Films, 195(1991)23.CrossRefGoogle Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Low Resistivity Transparent Indium Tin Oxide (Ito) Films Sputtered At Room Temperature With H2O Addition
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Low Resistivity Transparent Indium Tin Oxide (Ito) Films Sputtered At Room Temperature With H2O Addition
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Low Resistivity Transparent Indium Tin Oxide (Ito) Films Sputtered At Room Temperature With H2O Addition
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *