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Ion Projection Direct-Structuring For Nanotechnology Applications

Published online by Cambridge University Press:  11 February 2011

Hans Loeschner
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
Ernest J. Fantner
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
Regina Korntner
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
Elmar Platzgummer
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
Gerhard Stengl
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
Michaela Zeininger
Affiliation:
IMS Nanofabrication GmbH, A-1020 Vienna, Austria
J. E. E. Baglin
Affiliation:
IBM Almaden Research Center, San Jose, California, USA
Ruediger Berger
Affiliation:
IBM Storage Technology Division, Mainz, Germany
Wilhelm H. Brünger
Affiliation:
Fraunhofer Institute for Silicon Technology (ISiT), Itzehoe, Germany
Andreas Dietzel
Affiliation:
IBM Storage Technology Division, Mainz, Germany
Marie-Isabelle Baraton
Affiliation:
UMR6638 CNRS, University of Limoges, France CERAMEC, Limoges, France
Lhadi Merhari
Affiliation:
CERAMEC, Limoges, France
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Abstract

Large-field ion-optics has been developed for reduction printing. Sub-100nm ion projection direct-structuring (IPDS) of patterned magnetic media discs has been demonstrated, extending over 17mm diameter exposure fields, in a single exposure. First results of IPDS patterning of nanocomposite resist material are presented. Information about a novel 200x reduction projection focused ion multi-beam (PROFIB) tool development is provided. Further IPDS nanotechnology applications are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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