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In-Situ Infrared (IR) Detection and Heating of the High Pressure Phase of Silicon during Scratching Test

Published online by Cambridge University Press:  01 February 2011

Lei Dong
Affiliation:
Center for Precision Engineering, University of North Carolina at Charlotte, Charlotte, NC 28223–0001, U.S.A.
John A. Patten
Affiliation:
Manufacturing Research Center, Western Michigan University, Kalamazoo, MI 49008, U.S.A.
Jimmie A. Miller
Affiliation:
Center for Precision Engineering, University of North Carolina at Charlotte, Charlotte, NC 28223–0001, U.S.A.
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Abstract

A novel method of in-situ detection of the high pressure phase transformation of silicon during dead-load scratching is described. The method is based on the simple fact that single crystal silicon is transparent to Infrared light while metallic materials are not. Infrared heating during scratching has been performed to thermally soften and deform the transformed metallic material and some promising results were obtained. The sample material used here is silicon, but the same approach can be applied to germanium and other materials, such as ceramics (SiC), which have appropriate optical properties.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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In-Situ Infrared (IR) Detection and Heating of the High Pressure Phase of Silicon during Scratching Test
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