Skip to main content Accessibility help
×
Home
Hostname: page-component-59df476f6b-wmsn8 Total loading time: 0.331 Render date: 2021-05-18T03:35:24.576Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true }

Improving the Thermal Stability of Photoresist Films by Ion Beam Irradiation

Published online by Cambridge University Press:  10 February 2011

F. C. Zawislak
Affiliation:
Instituto de Física, UFRGS, Caixa Postal 15051, 91501-970 Porto Alegre, Brasil
Irene T. S. Garcia
Affiliation:
PGCIMAT, UFRGS, Porto Alegre, Brasil
D. Samios
Affiliation:
Instituo de Química UFRGS, Porto Alegre, Brasil
D. L. Baptista
Affiliation:
Instituto de Física, UFRGS, Caixa Postal 15051, 91501-970 Porto Alegre, Brasil
P. F. P. Fichtner
Affiliation:
Escola de Engenharia, UFRGS, Porto Alegre, Brasil
E. Alves
Affiliation:
Instituto Tecnológico e Nuclear, Sacavém, Portugal
Maria F. Da Silva
Affiliation:
Instituto Tecnológico e Nuclear, Sacavém, Portugal
J. C. Soares
Affiliation:
Centro de Física Nuclear, UL, Lisboa, Portugal
Get access

Abstract

The thermal stability of ion irradiated 1.7 μm thick AZ-1350J photoresist films was investigated using the RBS and ERDA techniques to measure the composition of the irradiated and annealed films. The films have been irradiated with He, N and Ar ions at energies from 380 to 760 keV and fluences between 2 × 1015 and 1016 ions cm−2. A considerable increase in the thermal stability of the He irradiated film is observed from ≈200°C – when the non-irradiated film starts to decompose – to 400°C after the irradiation. The FTIR spectroscopy and the SEM observations were used to study the chemical structural changes and the surface morphology of the irradiated samples. The results are discussed in terms of the energy density deposited by the ions, the large loss of H during irradiation, and the resulting increase in cross-linking density.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Venkatesan, T., Calcagno, L., Elman, B.S. and Foti, G., in Ion Beam Modification of Polymers, edited by Mazzoldi, P. and Arnold, G.W. (Elsevier, N.Y. 1987), p. 301.Google Scholar
2. Lee, E.H., Lewis, M.B., Blau, P.J., and Mansur, L.K., J. Mater. Res. 6, p. 610 (1991).CrossRefGoogle Scholar
3. Rao, G.R. and Lee, E.H., J. Mater. Res. 11, p. 2661 (1996).CrossRefGoogle Scholar
4. Behar, M., Amaral, L., Zawislak, F.C., Guimarães, R.B. and Fink, D., Nucl. Intrum. and Meth. B 46, p. 350 (1990).CrossRefGoogle Scholar
5. Behar, M., Guimarães, R.B., Grande, P.L., Amaral, L., Biersack, J.P., Fink, D., Kaschny, J.R. and Zawislak, F.C., Phys. Rev. B 41, p. 6145 1990).CrossRefGoogle Scholar
6. Maltez, R.L., Amaral, L., Behar, M. and Zawislak, F.C., Nucl. Intrum. and Meth. B 80/81, p. 1316 (1993).CrossRefGoogle Scholar
7. Biersack, J.P. and Haggmark, L.G., Nucl. Instrum. and Meth. 174, p. 257 (1980).CrossRefGoogle Scholar
8. Wang, Yongqiang, Mohite, S.S., Bridwell, L.B., Giedd, R.E. and Sofield, C.J., J. Mater. Res. 8, p. 388 (1993).CrossRefGoogle Scholar
9. Hall, T.M., Wayner, A. and Thompson, L.F., J. Appl. Phys. 53, p. 3997 (1982).CrossRefGoogle Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Improving the Thermal Stability of Photoresist Films by Ion Beam Irradiation
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Improving the Thermal Stability of Photoresist Films by Ion Beam Irradiation
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Improving the Thermal Stability of Photoresist Films by Ion Beam Irradiation
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *