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Hard X-ray beam damage study of monolayer Ni islands using SX-STM

Published online by Cambridge University Press:  13 February 2015

Nozomi Shirato
Affiliation:
Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
Marvin Cummings
Affiliation:
Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
Heath Kersell
Affiliation:
Nanoscale and Quantum Phenomena Institute, Physics & Astronomy Department, Ohio University, Athens, OH 45701, USA.
Yang Li
Affiliation:
Nanoscale and Quantum Phenomena Institute, Physics & Astronomy Department, Ohio University, Athens, OH 45701, USA.
Dean Miller
Affiliation:
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA.
Daniel Rosenmann
Affiliation:
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA.
Saw-Wai Hla
Affiliation:
Nanoscale and Quantum Phenomena Institute, Physics & Astronomy Department, Ohio University, Athens, OH 45701, USA. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA.
Volker Rose
Affiliation:
Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL 60439, USA.
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Abstract

X-ray beam-induced damage in nanoscale metal islands was investigated. Monolayer-high Ni islands were prepared on a Cu(111) substrate. High brilliance X-rays with photon energies between 8.45 and 8.85 keV illuminated the sample for about 11 hours. In order to track changes in the morphology of the islands, the synchrotron X-ray scanning tunneling microscopy (SX-STM) technique was utilized. The result shows that X-ray illumination onto Ni islands does not induce noticeable damage. The study demonstrates that local beam-induced changes can be studied using SX-STM.

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Copyright
Copyright © Materials Research Society 2015 

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Hard X-ray beam damage study of monolayer Ni islands using SX-STM
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