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Growth and Composition of LPCVD Silicon Oxynitride Films

Published online by Cambridge University Press:  22 February 2011

F. H. P. M. Habraken
Affiliation:
Technical Physics Department,Utrecht State University, P.O. Box 80.000, 3508 TA Utrecht,The Netherlands
A. E. T. Kuiper
Affiliation:
Philips Research Laboratories, 5600 JA Eindhoven,The Netherlands
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Abstract

Silicon oxynitride films with various O/N concentration ratios were deposited in a Low Pressure Chemical Vapour Deposition process from SiH2Cl2, N2O and NH3 or ND3. The resulting films were analysed with respect to their chemical compositions using a number of high energy ion beam methods. The results of the analysis are related to the growth kinetics. It is suggested that the SiH2Cl2 decomposes more difficult on growth surfaces which contain more oxygen. The effect is attributed to the larger electronegativity of oxygen compared to nitrogen.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

1) Kuiper, A.E.T., Koo, S.W., Habraken, F.H.P.M. and Tamminga, Y., J. Vac. Sci. & Technol. B1, 62 (1983).CrossRefGoogle Scholar
2) Habraken, F.H.P.M., Kuiper, A.E.T., Oostrom, A. van, Tamminga, Y. and Theeten, J.B., J. Appl. Phys. 53, 404 (1982).CrossRefGoogle Scholar
3) Weil, J.L. and Jones, K.W., Phys. Rev. 112 1975 (1958)CrossRefGoogle Scholar
4) Habraken, F.H.P.M., Tijhaar, R.H.G., Weg, W.F. van der, Kuiper, A.E.T. and Willemsen, M.F.C., to be published.Google Scholar
5) Oostrom, A. van, Augustus, L., Habraken, F.H.P.M. and Kuiper, A.E.T., J. Vac. Sci. Technol. 20, 953 (1982).CrossRefGoogle Scholar
6) Stein, H.J., J. Electron. Mater. 5, 161 (1976).CrossRefGoogle Scholar
7) Maes, H.E. and Remmerie, J., Proc. Silicon Nitride Thim Insulating Films, ECS 838, 73 (1983).Google Scholar
8. Remmerie, J. and Maes, H.E., to be published. M.J.H. Kemper, S.W. Koo, Y. Tamminga and M.F.C. Willemsen, Private Communication.Google Scholar
9) Schaefer, J.A., Frankel, D., Stucki, F., Gopfel, W. and Lapeyre, G.J., Surf. Sci. 139, L209 (1984).CrossRefGoogle Scholar
10) Lucovsky, G., Solid State Comm. 29, 571 (1979).CrossRefGoogle Scholar
11) Verstegen, B., Habraken, F.H.P.M., Berg, W.F. van der, Holsbrink, J. and Snijder, J., J. Appl. Phys., 57, 2766 (1985).CrossRefGoogle Scholar

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