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Formation of Shallow Energy Levels in Mn+ Implanted GaAs with Extremely Low Background Impurity Concentration

Published online by Cambridge University Press:  22 February 2011

Yunosuke Makita
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Akimasa Yamada
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Shigeru Niki
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Tsutomu Iida
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Hajime Shibata
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Paul Fons
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
Akira Obara
Affiliation:
Electrotcchnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305, Japan
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Abstract

Manganese ions implantation into ultrapure GaAs layers grown by molecular beam epitaxy were investigated by photoluminescence technique systematically in a wide range of manganese concentration up to 1×1020cm-3. Five shallow emission bands denoted by (Mn°, X), “G”, “G' “ “H” and (D, A)2 are formed in the implanted layers in addition to the well known Mn impurity related emission at ~880nm. With increasing manganese concentration to 1×1019cm-3, “G” exhibits no energy shift, suggesting that “G” is different from the behavior of [g-g] emission that is commonly formed in shallow acceptor (such as C) incorporated ultrapure GaAs. (Mn°, X), “G” and “G' “ present no energy shift with increasing excitation intensity, while “H” and (D, A)2 indicate peak energy shift greatly showing typical donor-acceptor pair characteristics. “G” and (Mn°, X) are found to hold similar radiative origin which is different from “G”. Temperature dependence measurement reveals that emission “G” has a thermal activation energy of 5.4meV.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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Formation of Shallow Energy Levels in Mn+ Implanted GaAs with Extremely Low Background Impurity Concentration
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