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Excimer Laser Photodissociation Studies of Disilane AT 193 nm
Published online by Cambridge University Press: 25 February 2011
Abstract
Optical emission, laser spectroscopic and mass spectrometric techniques have been used to study the ArF excimer laser induced photochemistry of disilane at 193 nm. Evidence is found for the formation of a number of photofragments from single and multiphoton dissociation. Effects due to secondary photolysis are observed at high excimer laser repetition rates.
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- Copyright © Materials Research Society 1989
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