Skip to main content Accessibility help
×
Home
Hostname: page-component-684899dbb8-p6h7k Total loading time: 0.25 Render date: 2022-05-20T21:38:40.927Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "useRatesEcommerce": false, "useNewApi": true }

Epitaxial Growth of FeSi2 on (111)Si

Published online by Cambridge University Press:  22 February 2011

H.C. Cheng
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, ROC.
L.J. Chen
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, ROC.
T.R. Your
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, ROC.
Get access

Abstract

Isothermal annealing, two step annealing and ion beam mixing were performed to induce interfacial reactions between iron thin films and silicon substrate. Both orthorhombic and tetragonal FeSi2 were found to grow epitaxially on (lll)Si with orthorhombic FeSi2 being the predominant phase. No epitaxial growth of FeSi2 on (001)Si was detected. Epitaxial islands as large as 40 μm in size were formed by a scheme combining ion beam mixing and two step annealing.

Type
Research Article
Copyright
Copyright © Materials Research Society 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Poate, J.M., Tu, K.N. and Mayer, J.W. (eds.), Thin Films — Interdiffusion and Reactions, (Wiley, New York 1978).Google Scholar
2. Chen, L.J., Mayer, J.W., Tu, K.N. and Sheng, T.T., Thin Solid Films, 93, 91 (1982).CrossRefGoogle Scholar
3. Chen, L.J., Mayer, J.W. and Tu, K.N., Thin Solid Films, 93, 135 (1982).CrossRefGoogle Scholar
4. Dusausoy, P.Y., Protas, J., Wandji, R. and Roques, B., Acta Cryst., B27, 1209 (1971).CrossRefGoogle Scholar
5. Pearson, W.B., The Crystal Chemistry and Physics of Metals and Alloys, (Wiley-Interscience, New York 1972).Google Scholar
6. Chen, L.J. and Hou, C.Y., Thin Solid Films, 104, 167 (1983).CrossRefGoogle Scholar
7. Chen, L.J. and Chang, T.T., Thin Solid Films, 104, 183 (1983).CrossRefGoogle Scholar

Save article to Kindle

To save this article to your Kindle, first ensure coreplatform@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Epitaxial Growth of FeSi2 on (111)Si
Available formats
×

Save article to Dropbox

To save this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Dropbox account. Find out more about saving content to Dropbox.

Epitaxial Growth of FeSi2 on (111)Si
Available formats
×

Save article to Google Drive

To save this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Google Drive account. Find out more about saving content to Google Drive.

Epitaxial Growth of FeSi2 on (111)Si
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *