Skip to main content Accessibility help
×
Home
Hostname: page-component-558cb97cc8-7xspw Total loading time: 0.56 Render date: 2022-10-06T17:58:01.866Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "useRatesEcommerce": false, "displayNetworkTab": true, "displayNetworkMapGraph": true, "useSa": true } hasContentIssue true

Effects of the Ultra Low Diluted Ceria-Based Slurry on the Planarization Characteristics of Multi-Layer Exposed Surfaces

Published online by Cambridge University Press:  01 February 2011

Kyung Ho Hwang
Affiliation:
kyungho.hwang@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Jae Gon Choi
Affiliation:
Jaegon.choi@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Myung Shin Lee
Affiliation:
Myungshin.Lee@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Yong Soo Choi
Affiliation:
Yongsoo.choi@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Geun Min Choi
Affiliation:
Geunmin.choi@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Yong Wook Song
Affiliation:
Yongwook.song@hynix.com, Hynix Semiconductor Inc., R & D Division, Ami-ri Bubal-eub, Icheon-si, Kyoungki-do, 467-701, Korea, Republic of
Get access

Abstract

Planarization characteristics of ultra low diluted Ceria (CeO2) based slurry, especially a multi-layered Chemical Mechanical Polishing (CMP) process, have been studied. The multi-layer represents the polished film consists of more than two different materials, so that, more than two different materials are exposed to the polished surface. In this work, ultra low diluted ceria based slurry was introduced to minimize micro-dishing effect of the process such as a storage node contact and a bit line contact in 80nm feature sized DRAM device, which has multi-layer film surfaces. As a result, we can minimize micro dishing of silicon dioxide and polycrystalline silicon at memory cell area, and silicon dioxide dishing at peripheral area.

Keywords

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Cook, L.M., J. Non-Cryst. Solids, 120, 152 (1990).CrossRefGoogle Scholar
[2] Hoshino, T., Kurata, Y., Terasaki, Y., and Susa, K., J. Non-Cryst. Solids, 283, 129 (2001).CrossRefGoogle Scholar
[3] Oliver, M.R.. Chemical Mechanical Planarization of Semiconductor Materials (Springer-Verlag Berlin Heidelberg 2004) p. 286 CrossRefGoogle Scholar
[4] Yang, W.L., Cheung, C.Y., Tsai, M.S., Lie, D.G., and Shieh, M.S., IEEE ELECTRON DEVICE LETTER, VOL.21, NO.5 MAY (2000).Google Scholar
[5] Yasseen, A.A., Mourlas, N.J., and Mehregany, M.. J. Electrochem. Soc., Vo. 144, No.1 JAN 1997.CrossRefGoogle Scholar

Save article to Kindle

To save this article to your Kindle, first ensure coreplatform@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Effects of the Ultra Low Diluted Ceria-Based Slurry on the Planarization Characteristics of Multi-Layer Exposed Surfaces
Available formats
×

Save article to Dropbox

To save this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Dropbox account. Find out more about saving content to Dropbox.

Effects of the Ultra Low Diluted Ceria-Based Slurry on the Planarization Characteristics of Multi-Layer Exposed Surfaces
Available formats
×

Save article to Google Drive

To save this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you used this feature, you will be asked to authorise Cambridge Core to connect with your Google Drive account. Find out more about saving content to Google Drive.

Effects of the Ultra Low Diluted Ceria-Based Slurry on the Planarization Characteristics of Multi-Layer Exposed Surfaces
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *