Skip to main content Accessibility help
×
Home
Hostname: page-component-6f6fcd54b-gw92j Total loading time: 0.217 Render date: 2021-05-11T11:22:57.029Z Has data issue: true Feature Flags: {}

Effects of HWCVD-deposited Seed Layers on Hydrogenated Microcrystalline Silicon Films on Glass Substrates

Published online by Cambridge University Press:  01 February 2011

Michael Musashi Adachi
Affiliation:
mmadachi@sfu.ca, Simon Fraser University, School of Engineering, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada, 604-825-2164
Wing Fai Lydia Tse
Affiliation:
ltse@sfu.ca, Simon Fraser University, School of Engineering Science, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
Garnet Cluff
Affiliation:
gcluff@sfu.ca, Simon Fraser University, Department of Physics, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
Karen L. Kavanagh
Affiliation:
kavanagh@sfu.ca, Simon Fraser University, Department of Physics, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
Karim S. Karim
Affiliation:
kkarim@sfu.ca, Simon Fraser University, School of Engineering Science, 8888 University Drive, Burnaby, BC, V5A 1S6, Canada
Get access

Abstract

Microcrystalline silicon was deposited by hot-wire chemical vapor deposition (HWCVD) using a graphite filament with and without a thin 50 nm microcrystalline silicon seed layer. Increasing silane concentration diluted in H2 led to a decrease in crystalline fraction as well in a decrease in dark conductivity and photo-conductivity. In addition, films deposited with a seed layer were found to have higher dark conductivity and photo-conductivity than those without a seed layer but deposited at slower growth rates. However, Raman spectroscopy showed that use of a seed layer resulted in only a small increase in crystalline fraction at the surface of the films which had thicknesses between 250-400nm. TEM measurements confirmed the crystalline nature of deposited films showing average grain sizes of 25 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Brühne, K., Schubert, M. B., Köhler, C., Werner, J. H., Thin Solid Films 395, 163168 (2001).CrossRefGoogle Scholar
2. Bhusari, D.M., Kumar, P., Kupich, M., Schroeder, B., Mat. Res. Soc.Symp.Proc. Vol. 808, A9.30.16 (2004).CrossRefGoogle Scholar
3. Morrison, S., Madan, A., 28th IEEE Photovoltaic Specialists Conference 2000, 837–40 (2000).CrossRefGoogle Scholar
4. Sharma, S.N., Bandyopadhyay, A.K., Banerjee, R., A.Batabyal, K., Barua, A.K., Phys. Rev. B, Vol. 41(5), 45034506 (1991).CrossRefGoogle Scholar
5. Veen, Van, Katherine, Marieke, Ph.D. dissertation, Utrecht University, Netherlands, 2346 (2003).Google Scholar
6. Klein, S., Repmann, T.,Brammar, T., Solar Energy 77, 893908 (2004).CrossRefGoogle Scholar
7. Moutinho, H.R. et al. , Thin Solid Films 430, 135140 (2003).CrossRefGoogle Scholar
8. Williams, D.B., Carter, C.B., Transmission Electron Microscopy, (Plenum Press, New York, (1996), pp. 273275.CrossRefGoogle Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Effects of HWCVD-deposited Seed Layers on Hydrogenated Microcrystalline Silicon Films on Glass Substrates
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Effects of HWCVD-deposited Seed Layers on Hydrogenated Microcrystalline Silicon Films on Glass Substrates
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Effects of HWCVD-deposited Seed Layers on Hydrogenated Microcrystalline Silicon Films on Glass Substrates
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *