Hostname: page-component-586b7cd67f-r5fsc Total loading time: 0 Render date: 2024-12-06T12:08:20.714Z Has data issue: false hasContentIssue false

Dual Function Polyvinyl Alcohol Based Oxide Precursors for Nanoimprinting and Electron Beam Lithography

Published online by Cambridge University Press:  29 May 2013

J. Malowney
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
N. Mestres
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
X. Borrise
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain Catalan Nanotechnology Institute (ICN), Bellaterra, 08193, Spain
A. Calleja
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
R. Guzman
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
J. Llobet
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
J. Arbiol
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain Catalan Institution for Research and Advanced Studies (ICREA), Barcelona, 08010, Spain
T. Puig
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
X. Obradors
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
J. Bausells
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
Get access

Abstract

Ordered arrays of crystalline complex oxides nanostructures were synthesized onto single crystal insulating substrates using aqueous polyvinyl alcohol based electron beam resist precursors. The irradiated zones are insoluble in water (negative-tone resist) due to the electron induced cross linking of polyvinyl alcohol. The subsequent high temperature treatment of the developed precursor samples leads to the formation of ordered arrays of nanodots for low irradiation doses. For high irradiation dosages, epitaxially and oriented nanowires are obtained. These same precursors were shown to be nanoimprintable on single crystal substrates. This allows for future dual processing of a single precursor film gaining nano-structuration from both electron beam and nanoimprint lithography methods.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Yamanaka, S., Kanki, T., Kawai, T., Tanaka, H., Nano Lett. 11, 343347 (2011).CrossRefGoogle Scholar
Hyun, K.-Ch. et al. ., Journal of Physical Chemistry C 113, 70857090 (2009).Google Scholar
Carretero-Genevrier, A. et al. ., Advanced Functional Materials 20, 892897 (2010).CrossRefGoogle Scholar
Zabaleta, J. et al. ., Journal of Applied Physics 111, 024307 (2012).CrossRefGoogle Scholar
Carretero-Genevrier, A. et al. ., Chem. Comm. 48, 62236225 (2012).CrossRefGoogle Scholar
Coey, J.M.D., Viret, M., von Molnar, S., Adv. Phys. 48, 167293 (1999).CrossRefGoogle Scholar
Haghiri-Gosnet, A.M., Renard, J.P., J. Phys. D: Appl. Phys. 36, R127–R150 (2003).CrossRefGoogle Scholar
Chuang, C.M. et al. ., Nanotechnology 17, 43994404 (2006).CrossRefGoogle Scholar
Wu, M.C. et al. ., Journal of Materials Chemistry 18, 780785 (2008).CrossRefGoogle Scholar
Tao, J. et al. ., Microelectronic Engineering 78–79, 665669 (2005).CrossRefGoogle Scholar
Martin, C., Ressier, L., and Peyrade, J.P., Physica E: Low-dimensional Systems and Nanostructures 17, 523525 (2003).CrossRefGoogle Scholar
Chou, S.Y. and Krauss, P.R., Microelectronic Engineering 35, 237240 (1997).CrossRefGoogle Scholar
Guo, L., Krauss, P.R., and Chou, S.Y., Applied Physics Letters 71, 18811883 (1997).CrossRefGoogle Scholar
Lebib, A. et al. ., Microelectronic Engineering 46, 319322 (1999).CrossRefGoogle Scholar