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Dual Function Polyvinyl Alcohol Based Oxide Precursors for Nanoimprinting and Electron Beam Lithography

Published online by Cambridge University Press:  29 May 2013

J. Malowney ,
N. Mestres ,
X. Borrise ,
A. Calleja ,
R. Guzman ,
J. Llobet ,
J. Arbiol ,
T. Puig ,
X. Obradors  and
J. Bausells
J. Malowney
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
N. Mestres
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
X. Borrise
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain Catalan Nanotechnology Institute (ICN), Bellaterra, 08193, Spain
A. Calleja
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
R. Guzman
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
J. Llobet
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
J. Arbiol
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain Catalan Institution for Research and Advanced Studies (ICREA), Barcelona, 08010, Spain
T. Puig
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
X. Obradors
Affiliation:
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC), Bellaterra, 08193, Spain
J. Bausells
Affiliation:
Institut de Microelectrònica de Barcelona (IMB-CSIC), Bellaterra, 08193, Spain
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Abstract

Ordered arrays of crystalline complex oxides nanostructures were synthesized onto single crystal insulating substrates using aqueous polyvinyl alcohol based electron beam resist precursors. The irradiated zones are insoluble in water (negative-tone resist) due to the electron induced cross linking of polyvinyl alcohol. The subsequent high temperature treatment of the developed precursor samples leads to the formation of ordered arrays of nanodots for low irradiation doses. For high irradiation dosages, epitaxially and oriented nanowires are obtained. These same precursors were shown to be nanoimprintable on single crystal substrates. This allows for future dual processing of a single precursor film gaining nano-structuration from both electron beam and nanoimprint lithography methods.

Keywords

nanoscaleelectron irradiationferromagnetic
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1547: Symposium M – Solution Synthesis of Inorganic Functional Materials—Films, Nanoparticles and Nanocomposites , 2013 , pp. 75 - 80
Copyright
Copyright © Materials Research Society 2013 

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References

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