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Deposition of Thick Silicon Layers on Glass Substrate for Photovoltaic Application
Published online by Cambridge University Press: 10 February 2011
Abstract
A new silicon deposition reactor fabricated in our laboratory is presented in this paper. It works at Sub-Atmospherical total pressure, so it is a SAPCVD reactor. The deposition rates and electronic transport properties are compared with a conventional LPCVD reactor.
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- Copyright © Materials Research Society 1998