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The Deposition of Nickel Boride Thin Films by Borane and Metallaborane Cluster Compounds

Published online by Cambridge University Press:  25 February 2011

John A. Glass Jr.
Affiliation:
Department of Chemistry and the Center for Molecular Electronics, Syracuse University, Syracuse, New York 13244–4100
Shreyas Kher
Affiliation:
Department of Chemistry and the Center for Molecular Electronics, Syracuse University, Syracuse, New York 13244–4100
Yoon-Gi Kim
Affiliation:
Department of Physics and the Center for Molecular Electronics, Syracuse University, Syracuse, New York 13244–1130
P.A. Dowben
Affiliation:
Department of Physics and the Center for Molecular Electronics, Syracuse University, Syracuse, New York 13244–1130
James T. Spencer
Affiliation:
Department of Chemistry and the Center for Molecular Electronics, Syracuse University, Syracuse, New York 13244–4100
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Abstract

The deposition of high purity and controlled stoichiometry metal boride thin-film materials has recently received considerable interest. Borane clusters and their corresponding metal complexes are currently being investigated in our laboratories for their utility as unique source materials for the formation of metallic boride thin films by MOCVD. Variable composition nickel boride thin films ranging from 0.1 micron to several microns have been prepared. These new materials have been characterized by SEM, AES and XES. The magnetic properties of these new films have been investigated with torque magnetometry and magneto-optic Kerr effect magnetometry.

Type
Research Article
Copyright
Copyright © Materials Research Society 1991

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