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Deposition of Diamond-Like Carbon Films by PECVD

Published online by Cambridge University Press:  15 February 2011

Kyu Chang Park
Affiliation:
Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Soo Chul Chun
Affiliation:
Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Kyo Jun Song
Affiliation:
Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Min Park
Affiliation:
Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
Myung Hwan Oh
Affiliation:
Korea Institute of Science and Technology, Seoul 136-792, Korea
Seong Soo Choi
Affiliation:
Department of Physics, Sun Moon University, Chung Nam 337-840, Korea
Jung Hae Park
Affiliation:
Department of Physics, Ewha Womans University, Seoul 120-750, Korea
In Sang Yang
Affiliation:
Department of Physics, Ewha Womans University, Seoul 120-750, Korea
Jin Jang
Affiliation:
Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701, Korea
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Abstract

We have studied the structural properties of hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition (PECVD). The substrate holder in reaction chamber could be biased and be heated. The Raman peak intensity at 1350 cm−1 was increased by reducing CH4 flow rate. The film structure changed from soft a-C:H to hard carbon with decreasing CH4 flow rate, resulted from increased self-bias. The 1520 cm−1 peak shifts to higher frequency by reducing the CH4flow rate, probably resulted from the increased internal stress.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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