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Degradation of Current Gain for Ion Implanted 4H-SiC Bipolar Junction Transistor

Published online by Cambridge University Press:  31 January 2011

Yuki Watabe
Affiliation:, Hosei University, Tokyo, Japan
Taku Tajima
Affiliation:, Hosei University, Tokyo, Japan
Tohru Nakamura
Affiliation:, Hosei University, Tokyo, Japan
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Degradation of current gain for ion implanted 4H-SiC bipolar junction transistor is described. The influence of bandgap-narrowing to the collector and base currents of the transistor was investigated using ISE-TCAD simulator. Simulated results show good agreement with the measured results, which show that the common emitter current gain of 3.9 is obtained at a maximum base concentration of 2×1017/cm3 and a maximum emitter concentration of 4×1019/cm3 for ion implanted 4H-SiC BJTs.

Research Article
Copyright © Materials Research Society 2010

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