Skip to main content Accessibility help
×
Home
Hostname: page-component-564cf476b6-qq8pn Total loading time: 0.267 Render date: 2021-06-21T21:06:58.248Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true }

Defects and Their Control in SiO2 Films Prepared by D2 –Lamp Photochemical Vapor Deposition

Published online by Cambridge University Press:  25 February 2011

Hidehiko Nonaka
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan
Kazuo Arai
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan
Shingo Ichimura
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan
Get access

Abstract

Amorphous silica films deposited from the mixture of gases (Si2 H6 and Si2F6) by deutrium-lamp CVD were studied by IR, vacuum UV, EPR and Auger electron (AE) spectrometries. The F-doping enhanced the film growth and removed defects in the film such as -H, -OH, and E' centers. A model on deposition and defect formation mechanisms was proposed based on the thermodynamic Stabilities of resultant HF in the reactions. The AES study showed that the film surface modified by activated oxygen had an increased hardness against electron beams.

Type
Research Article
Copyright
Copyright © Materials Research Society 1989

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Nonaka, H., Arai, K., Fujino, Y., and Ichimura, S., J. Appl. Phys. 64, 4168 (1988).CrossRefGoogle Scholar
2. Silva, E. F. da Jr, Nishioka, Y., and Ma, T.- P., IEEE Trans. On Nuclear Science, 34, 1190 (1987).CrossRefGoogle Scholar
3. Shibata, S. and Nakamura, M., J. Lightwave Technol., 3, 860 (1985).CrossRefGoogle Scholar
4. Imai, H., Arai, K., Saito, T, Ichimura, S., Nonaka, H., Vigouroux, J. P., Hosono, H., Abe, Y., and Imagawa, H., in Proceedings of the Physics and Technology of Amorphous SiO2, 1987, edited by Arndt, J., Devine, R., and Revesz, A. ( Plenum, New York, in press). Detailed discussion will be given by H. Imagawa and H. Hosono et al.Google Scholar
5. Imai, H., Aral, K., Imagawa, H., Hosono, H., and Abe, Y., Phys. Rev. in press.Google Scholar
6. Stathis, H. and Kastmer, M. A.. Phys. Rev. 89, 7079 (1984).CrossRefGoogle Scholar
7. Devine, A. B., Fiori, C., and Robertson, J., MRS Symp. Proc. 61, 177 (1986).CrossRefGoogle Scholar
8. Maki, K. and Shigeta, Y., Jpn. J. Appl. Phys. 20, 1047 (1981).CrossRefGoogle Scholar
9. Chao, S. S., Tyler, J. E., Takagi, Y., Pai, P. G., Lucovsky, G., Lin, S. Y., Wong, C. K., and Mantini, M. J., J. Vac. Sci. Technol., A 3, 1574 (1986).CrossRefGoogle Scholar
10. Fiori, C. and Devine, R. A. B., Phys. Rev. Lett., 52, 2081 (1984).CrossRefGoogle Scholar
11. Nonaka, H., Arai, K., and Isoya, J., unpublished.Google Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Defects and Their Control in SiO2 Films Prepared by D2 –Lamp Photochemical Vapor Deposition
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Defects and Their Control in SiO2 Films Prepared by D2 –Lamp Photochemical Vapor Deposition
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Defects and Their Control in SiO2 Films Prepared by D2 –Lamp Photochemical Vapor Deposition
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *