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Cracking and Delamination of Heteroepitaxial Barium Hexaferrite Films

Published online by Cambridge University Press:  10 February 2011

S.A. Oliver
Affiliation:
Center for Electromagnetic Research, Northeastern University, Boston, MA 02115, saoliver@neu.edu
I. Kozulin
Affiliation:
Department of Electrical and Computer Engineering, Northeastern University, Boston MA 02115.
N.E. Mcgruer
Affiliation:
Department of Electrical and Computer Engineering, Northeastern University, Boston MA 02115.
C. Vittoria
Affiliation:
Department of Electrical and Computer Engineering, Northeastern University, Boston MA 02115.
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Abstract

Experimental results are shown for the structural and stress behaviors of c-axis oriented barium hexaferrite films on c-plane sapphire (Al2O3) substrates as a function of oxygen growth pressure and film thickness. It is shown that films deposited at 20 mTorr crack and delaminate at thicknesses above 15 µm, but that evidence for these large stresses is not apparent in either substrate curvature measurements or distortion of the c-axis lattice constant for thinner films (< 2 µm). In contrast, films (< 4 µm) deposited at 300 mTorr show large substrate curvatures that relax with increasing film thickness, in tandem with the formation of first large outgrowths, and then polycrystalline grains as the original c-axis film texture is randomized. Correlations between these observations are made to explain the complex evolution of properties in these films.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

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