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Chloroethane Physisorbed on Hydrogenated Si(111): A Test System for the Evaluation of Core Level XPS Assignment Rules at Si/SiO2 Interfaces

Published online by Cambridge University Press:  10 February 2011

F. R. McFeely ,
K. Z. Zhang  and
Mark M. Banaszak Holl
F. R. McFeely
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10562
K. Z. Zhang
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10562
Mark M. Banaszak Holl
Affiliation:
IBM T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10562
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Abstract

We briefly review the controversy concerning the proper methodology for the assignment of soft x‐ray photoemission Si 2p core levels at Si/SiO2 interfaces. Evidence for Second nearest neighbor effects in the photoemission spectra of analogous free molecules in the gas phase are surveyed for the purpose of placing this controversy within a wider context. Physisorption experiments have been performed to inquire whether the second nearest neighbor effects found in free molecules are in any way reduced in their magnitude owing to the proximity to the highly polarizable Si surface. No evidence for such a diminution have been found.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 446: Amorphous and Crystalline Insulating Thin Films–1996 , 1996 , 15
Copyright
Copyright © Materials Research Society 1997

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References

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