Skip to main content Accessibility help
×
Home
Hostname: page-component-79b67bcb76-c5xhk Total loading time: 0.189 Render date: 2021-05-17T01:10:46.498Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true }

The characteristics of the Electrolyzed D.I.water with chemicals and the outline of the supply system

Published online by Cambridge University Press:  14 March 2011

Mitsuhiko Shirakashi
Affiliation:
Precision Machinery Group, Ebara Corporation 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Kenya Itoh
Affiliation:
Precision Machinery Group, Ebara Corporation 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Ichiro Katakabe
Affiliation:
Precision Machinery Group, Ebara Corporation 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Mamabu Tsujimura
Affiliation:
Precision Machinery Group, Ebara Corporation 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Takayuki Saitoh
Affiliation:
Center of Technology Development, Ebara Research CO., Ltd. 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Kaoru Yamada
Affiliation:
Center of Technology Development, Ebara Research CO., Ltd. 4-2-1, Honfujisawa, Fujisawa-shi, Kanagawa 251-8502, Japan
Naoto Miyashita
Affiliation:
Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company 8, Shinsugita-cho, Isogo-ku, Yokohama, Kanagawa 235-8522, Japan
Masako Kodera
Affiliation:
Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company 8, Shinsugita-cho, Isogo-ku, Yokohama, Kanagawa 235-8522, Japan
Yoshitaka Matsui
Affiliation:
Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company 8, Shinsugita-cho, Isogo-ku, Yokohama, Kanagawa 235-8522, Japan
Get access

Abstract

In semiconductor device production, wafers are treated through many cleaning processes. Usually, several chemicals are used so as to match for several purposes like RCA cleaning method. As wafer size becomes larger, large amount of cleaning chemicals usage and waste are necessary, which becomes now a big problem. Considering the above, we developed the Electrolyzed D.I.water with chemicals supply system in order to minimize running cost of chemicals and waste treatment. It is feature that; 1) this system can generate the anode water of the acidity/high ORP (Oxidation-Reduction Potential) and the cathode water of the alkalinity/low ORP by electrolyzing D.I.water adding with a small quantity of chemicals; 2) this system can generate anode water and cathode water at the same time; 3) if necessary, the anode water can be diluted with D.I.water at the optional density, and it is possible with the cathode water that hydrogen peroxide is added. The anode water which shows acidity/high ORP has the effect of removing metal and organic contamination, and the cathode water which shows alkalinity/low ORP has the effect of particle removal. In this report, we explain the outline of this system and the basic characteristic of the Acid and Alkaline water made with this system and its performances.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below.

References

Kashiwagi, M. Hattori, A.: ”Cleaning technology of wafer surface”, Realize INC.Google Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

The characteristics of the Electrolyzed D.I.water with chemicals and the outline of the supply system
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

The characteristics of the Electrolyzed D.I.water with chemicals and the outline of the supply system
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

The characteristics of the Electrolyzed D.I.water with chemicals and the outline of the supply system
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *