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The Application of Silver Oxide Thin Films to Plasmon Photonic Devices

Published online by Cambridge University Press:  01 February 2011

Junji Tominaga
Affiliation:
Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562, Japan
Dorothea Büchel
Affiliation:
Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562, Japan
Christophe Mihalcea
Affiliation:
Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562, Japan
Takayuki Shima
Affiliation:
Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562, Japan
Toshio Fukaya
Affiliation:
Laboratory for Advanced Optical Technology, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, 305-8562, Japan
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Abstract

RF-magnetron sputtered thin films of silver oxide (AgOx) were recently applied to ultra-high density optical data storage. It has been elucidated that the AgOx film sandwiched by protection layers shows very attractive characteristics in strong light-scattering, local plasmon generation and super-resolution by focussing a laser beam on it. Especially, the combination with an active recording film (optical phase change or magneto-optical) used in the currently recordable optical disks improves the storage density and overcomes the diffraction limit. In this paper, we describe the basic characteristics of nano-scale light scattering centers generated in the AgOx films and the interaction with ultra-high density recorded mark patterns in a near-field region. In addition, we provide the structural transition of the AgOx film by thermal and laser annealing treatment.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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