Skip to main content Accessibility help
×
Home
Hostname: page-component-544b6db54f-8tjh8 Total loading time: 0.126 Render date: 2021-10-24T17:00:13.590Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": true, "newCiteModal": false, "newCitedByModal": true, "newEcommerce": true, "newUsageEvents": true }

Amorphous Carbon Nitride Films as a Candidate for Low Dielectric Constant Materials

Published online by Cambridge University Press:  10 February 2011

M. Aono
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
S. Nitta
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
T. Iwasaki
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
H. Yokoi
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
T. Itoh
Affiliation:
Department of Electrical Engineering, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
S. Nonomura
Affiliation:
Renewable Energy Systems, Gifu University, 1–1 Yanaido, Gifu, Japan 501–1193
Get access

Abstract

We have succeeded to prepare high resistivity and rather low dielectric constant amorphous carbon nitride films a-CNx (0.52<x<0.86) by the reactive radio frequency magnetron sputtering of a graphite target using nitrogen molecules as a sputter gas.

The resistivity of a-CNx are 5×1016 to 1017 Ω-cm and be estimated to 1020 Ω-cm, when the ratio of the carbon and nitrogen becomes chemically stoichiometry 3 to 4, i.e. C3N4. The resistivity of a-CNx films prepared by a layer-by-layer method, LL-a-CNx, is 1018 Ω -cm for x=0.6. The layer-by-layer method is a cyclic process of a deposition by the sputtering and an etching by atomic hydrogen. The sample LL-a-CNx made by a layer-by-layer method are compared with that of usual method a-CNx. The dielectric constant of a-CNx films calculated from the refractive index n are 3.6 to 2.8 corresponds to nitrogen contents, 0.52<x<0.86. The dielectric constants ε of a-CNx films decrease with the content of nitrogen x. At an ultimate component of a-CNx, at x=4/3, the dielectric constant is estimated to 1.8.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Chiang, C., et al. : “Low-Dielectric Constant Materials IV”, MRS Symposium Proceedings Vol. 511, 1998.Google Scholar
[2] Nitta, S., Takada, N., Sugiyama, K., Itoh, T. and Nonomura, S.: J. Non-Crystalline Solids 227–230, (1997) 655658.Google Scholar
[3] Takada, N., Arai, K., Nitta, S. and Nonomura, S.: Applied Surface Science 113/114, (1997) 274.10.1016/S0169-4332(96)00772-6CrossRefGoogle Scholar
[4] Iwasaki, T., Aono, M., Nitta, S., Itoh, T. and Nonomura, S.: Diamond and Related Materials (1999) in print.Google Scholar

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Amorphous Carbon Nitride Films as a Candidate for Low Dielectric Constant Materials
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Amorphous Carbon Nitride Films as a Candidate for Low Dielectric Constant Materials
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Amorphous Carbon Nitride Films as a Candidate for Low Dielectric Constant Materials
Available formats
×
×

Reply to: Submit a response

Please enter your response.

Your details

Please enter a valid email address.

Conflicting interests

Do you have any conflicting interests? *