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Resistive-nanoindentation: contact area monitoring by real-time electrical contact resistance measurement

Published online by Cambridge University Press:  07 June 2019

Solène Comby-Dassonneville ,
Fabien Volpi ,
Guillaume Parry ,
Didier Pellerin  and
Marc Verdier
Solène Comby-Dassonneville
Affiliation:
Univ. Grenoble Alpes, CNRS, Grenoble INP, SIMaP, 38000 Grenoble, France
Fabien Volpi*
Affiliation:
Univ. Grenoble Alpes, CNRS, Grenoble INP, SIMaP, 38000 Grenoble, France
Guillaume Parry
Affiliation:
Univ. Grenoble Alpes, CNRS, Grenoble INP, SIMaP, 38000 Grenoble, France
Didier Pellerin
Affiliation:
Scientec/CSInstruments, 91940 Les Ulis, France
Marc Verdier
Affiliation:
Univ. Grenoble Alpes, CNRS, Grenoble INP, SIMaP, 38000 Grenoble, France
*
Address all correspondence to Fabien Volpi at fabien.volpi@simap.grenoble-inp.fr
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Abstract

In the past decades, efforts have been made to couple nanoindentation with resistive measurements in order to monitor the real-time contact area, as an alternative to the use of traditional analytical models. In this work, a novel and efficient stand-alone method is proposed to compute the contact area using resistive-nanoindentation of noble metals (bulk or thin films). This method relies on three steps: tip shape measurement, set-up calibration, application to the sample to be characterized. The procedure is applied to nanoindentation tests on a sample with film-on-elastic-substrate rheology and is successfully validated against experimental measurements of the contact area.

Type
Research Letters
Information
MRS Communications , Volume 9 , Issue 3 , September 2019 , pp. 1008 - 1014
Copyright
Copyright © Materials Research Society 2019 

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