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An Overview of SiC Epitaxial Growth

Published online by Cambridge University Press:  29 November 2013

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SiC electronics research has been driven by the continued successful development of SiC technology for high-power and high-frequency semiconductor devices, and for service in high-temperature, corrosive, and high-radiation environments. The development of this technology has been accelerated by the introduction of commercially available SiC wafers, which have decreased in cost with time. The most recently demonstrated commercial SiC-based products include ultraviolet (uv)-flame sensors for terrestrial turbine engines and high-definition-television transmitter systems utilizing SiC-based transistors. Prototype microelectronic SiC devices include high-voltage Schottky rectifiers and power metal-oxide-semiconductor field-effect transistors, microwave and millimeter-wave devices, and high-temperature, radiation-resistant junction FETs (JFETs). These advancements in SiC-based device technology are attributable to both the successful development of commercially available, bulk SiC substrates and the recent advancements in SiC epitaxial layer growth technologies.

Type
Silicon Carbide Electronic Materials and Devices
Copyright
Copyright © Materials Research Society 1997

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References

1.Brown, D.M., Downey, E.T., Ghezzo, M., Kretchmer, J.W., Saia, R.J., Liu, Y.S., Edmond, J.A., Gati, G., Pimbley, J.M., and Schneider, W.E., IEEE Trans. Electron Devices 40 (2) (1993) p. 325.CrossRefGoogle Scholar
2.Westinghouse (April 15, 1996 Press Release), Westinghouse Electric Corporation presented at National Association of Broadcaster's Convention (Las Vegas Convention Center, 1996).Google Scholar
3.Bhatnagar, M. and Baliga, B.J., IEEE Trans. Electron Devices 40 (3) (1993) p. 645.CrossRefGoogle Scholar
4.Brandt, C.D., Agarwal, A.K., Augustine, G., Burk, A.A., Clarke, R.C., Glass, R.C., Hobgood, H.M., McHugh, J.P., McMullin, P.G., Siergiej, R.R., Smith, T.J., Sriram, S., Driver, M.C., and Hopkins, R.H., in Compound Semiconductors 1994, edited by Goronkin, H. and Mishra, U. (Institute of Physics Publishing, Bristol, 1995) p. 373.Google Scholar
5.Trew, R.J., Yan, J-B., and Mock, P.M., Proc. IEEE 79 (5) (1991) p. 598.CrossRefGoogle Scholar
6.McGarrity, J.M., McLean, F.B., De-Lancey, W.M., Palmour, J., Carter, C., Edmond, J., and Oakley, R.E., IEEE Trans. Nucl. Sci. 39 (6) (1992) p. 1974.CrossRefGoogle Scholar
7.Davis, R.F., Keiner, G., Shur, M., Palmour, J.W., and Edmond, J.A., Proc. IEEE 79 (5) (1991) p. 677.CrossRefGoogle Scholar
8.Matsunami, H., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series No. 137, Bristol, 1994) p. 45.Google Scholar
9.Tsvetkov, V.F., Allen, S.T., Kong, H.S., and, Carter, C. H. Jr., in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials 1995, edited by Nakashima, S., Matsunami, H., Yoshida, S., and Harima, H., (Institute of Physics Conference Series No. 142, Bristol, 1996) p. 17.Google Scholar
10.Larkin, D.J. and Interrante, L.V., Chem. Mater. 4 (1992) p. 22.CrossRefGoogle Scholar
11.Steckl, A.J., Yuan, C., Devrajan, J., Chaudhuri, J.C., Thokala, R., and Laboda, M.J., in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials 1995, edited by Nakashima, S., Matsunami, H., Yoshida, S., and Harima, H. (Institute of Physics Conference Series No. 142, Bristol, 1996) p. 181.Google Scholar
12.Hatayama, T., Fuyuki, T., and Matsunami, H., Chem. Mater. 4 (1992) p. 22.Google Scholar
13.Dmitriev, V. and Cherenkov, A., J. Cryst. Growth 128 (1993) p. 343.CrossRefGoogle Scholar
14. Emcore Corporation, 394 Elizabeth Avenue, Somerset, NJ 08873.Google Scholar
15.Biber, C.R., Wang, C.A., and Motakef, S., J. Cryst. Growth 123 (1992) p. 545.CrossRefGoogle Scholar
16.Thompson, A.G., Stall, R.A., Zawadzki, P., and Evans, G.H., J. Electron. Mater. 25 (9) (1996) p. 1487.CrossRefGoogle Scholar
17.Rupp, R., Lanig, P., Schorner, R., Dohnke, K.-O., Volkl, J., and Stephani, D. in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials 1995 (Institute of Physics Conference Series No. 142, Bristol, 1996) p. 185.Google Scholar
18. Aixtron GmbH, Kackerstr. 15-17, D-5100 Aachen, Germany.Google Scholar
19.Schulte, F., Strauch, G., Jurgensen, H., Niemann, E., and Leidich, D. in 2nd Int. High Temperature Electronics Conf., edited by King, D.B. and Thome, F.V. (Sandia National Laboratories, Charlotte, NC, 1994) p. X3.Google Scholar
20.Nishino, S., Powell, J.A., and Will, H.A., Appl. Phys. Lett. 42 (5) (1983) p. 460.CrossRefGoogle Scholar
21.Loboda, M.J., in Amorphous and Crystalline Silicon Carbide IV, edited by Yang, C.Y., Rahman, M.M., and Harris, G.L. (Springer-Verlag, Berlin/Heidelberg, 1992) p. 271.CrossRefGoogle Scholar
22.Steckl, A.J., Yuan, C., and Li, J.P., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series 137, Bristol, United Kingdom, 1994) p. 79.Google Scholar
23.Lely, J.A., Ber. Deut. Keram. Ges. 32 (1955) p. 229.Google Scholar
24.Beetz, C.P. Jr., Lin, C.Y., Carulli, J., Cummings, D., Gordon, D., and Nutt, S.R., in 1st Int. High Temperature Electronics Conf., edited by King, D. B. and Thome, F.V. (Sandia National Laboratories, Albuquerque, 1991) p. 186.Google Scholar
25. Cree Research, Inc., 2810 Meridian Parkway, Suite 176, Durham, NC 27713.Google Scholar
26.Tairov, Y.M. and Tsvetkov, V.F., J. Cryst. Growth 43 (2) (1978) p. 209.CrossRefGoogle Scholar
27.Powell, J.A., Larkin, D.J., Neudeck, P.G., Yang, J.W., and Pirouz, P., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series 137, Bristol, 1994) p. 161.Google Scholar
28.Powell, J.A. and Will, H.A., J. Appl. Phys. 43 (4) (1972) p. 1400.CrossRefGoogle Scholar
29.Neudeck, P.G. and Powell, J.A., IEEE Electron Device Lett. 15 (2) (1994) p. 63.CrossRefGoogle Scholar
30.Schaffer, W.J., Negley, G.H., Irvine, K.G., and Palmour, J.W. in Diamond, SiC and Nitride Wide Bandgap Semiconductors, edited by Carter, C.H. Jr., Gildenblat, G., Nakamura, S., and Nemanich, R.J. (Mater. Res. Soc. Symp. Proc. 339, Pittsburgh, 1994) p. 595.Google Scholar
31.Palmour, J.W., Edmond, J.A., Kong, H.S., and Carter, C.H. Jr., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series 137, Bristol, 1994) p. 499.Google Scholar
32.Palmour, J.W., Singh, R., Lipkin, L.A., and Waltz, D.G. in Trans. 3rd Int. High Temperature Electronics Conf. (Sandia National Laboratories, Albuquerque, 1996) p. XVI9.Google Scholar
33.Burk, A.A. Jr., Barrett, D.L., Hobgood, H.M., Siergiej, R.R., Braggins, T.T., Clarke, R.C., Eldridge, G.W., Brandt, C.D., Larkin, D.J., Powell, J.A., and Choyke, W.J., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series 137, Bristol, 1994) p. 29.Google Scholar
34.Matsunami, H., Shibahara, K., Kuroda, N., Yoo, W., and Nishino, S., in Amorphous and Crystalline Silicon Carbide, edited by Harris, G.L. and Yang, C.Y-W. (Springer-Verlag, Berlin/Heidelberg, 1989) p. 34.Google Scholar
35.Larkin, D.J., NASA Lewis Research Center presented at the 37th Electronic Materials Conference, (Charlottesville, VA, 1995).Google Scholar
36.Hallin, C., Konstantinov, A.O., Kordina, O., and Janzen, E., in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials 1995, edited by Nakashima, S., Matsunami, H., Yoshida, S., and Harima, H. (Institute of Physics, Conference Series No. 142, Bristol, 1996) p. 85.Google Scholar
37.Powell, J.A., Petit, J.B., Edgar, J.H., Jenkins, I.G., Matus, L.G., Choyke, W.J., Clemen, L., Yoganathan, M., Yang, J.W., and Pirouz, P., Appl. Phys. Lett. 59 (2) (1991) p. 183.CrossRefGoogle Scholar
38.Powell, J.A., Larkin, D.J., Zhou, L., and Pirouz, P., in Trans. 3rd Int. High Temperature Electronics Conf. (Sandia National Laboratories, Albuquerque, 1996) p. II3.Google Scholar
39.Powell, J.A. (private communication).Google Scholar
40. Cree Research, Inc., 2810 Meridian Parkway, Suite 176, Durham, NC 27713, in Data Sheet 4/91.Google Scholar
41.Larkin, D.J., Neudeck, P.G., Powell, J.A., and Matus, L.G., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Publishing Conference, Series 137, Bristol, 1994) p. 51.Google Scholar
42.Larkin, D.J., Neudeck, P.G., Powell, J.A., and Matus, L.G., Appl. Phys. Lett. 65 (13) (1994) p. 1659.CrossRefGoogle Scholar
43.Larkin, D.J., Sridhara, S.G., Devaty, R.P., and Choyke, W.J., J. Electron. Mater. 24 (4) (1995) p. 289.CrossRefGoogle Scholar
44.Larkin, D.J., in Proc. 6th Int. Conf. on Silicon Carbide and Related Materials 1995, edited by Nakashima, S., Matsunami, H., Yoshida, S., and Harima, H. (Institute of Physics Conference Series No. 142, Bristol, 1996) p. 23.Google Scholar
45.Karmann, S., Cioccio, L.D., Blanchard, B., Ouisse, T., Muyard, D., and Jaussaud, C., Mater. Sci. Eng. B 29 (1995) p. 134.CrossRefGoogle Scholar
46.Tischler, M.A. (private communication).Google Scholar
47.Neudeck, P.G., Larkin, D.J., Powell, J.A., Matus, L.G., and Salupo, C.S., Appl. Phys. Lett. 64 (11) (1994) p. 1386.CrossRefGoogle Scholar
48.Petit, J.B., Neudeck, P.G., Salupo, C.S., Larkin, D.J., and Powell, J.A., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series No. 137, Bristol, 1994) p. 679.Google Scholar
49.Neudeck, P.G., Petit, J.B., and Salupo, C.S., in 2nd Int. High Temperature Electronic Conf., edited by King, D.B. and Thome, F.V. (Sandia National Laboratories, Charlotte, NC, 1994) p. X23.Google Scholar
50.Davis, R.F. and Glass, J.T., in Advances in Solid-State Chemistry, edited by Catlow, C.R.A. (JAI Press Ltd., London, 1991).Google Scholar
51.Choyke, W.J., in The Physics and Chemistry of Carbides, Nitrides, and Bor ides (Kluwer, Dordrecht, 1990) p. 863.Google Scholar
52.Reinke, J., Greulich-Weber, S., Spaeth, J-M., Kalabukhova, E.N., Lukin, S.N., and Mokhov, E.N., in Proc. 5th Int. Conf. on Silicon Carbide and Related Materials, edited by Spencer, M.G., Devaty, R.P., Edmond, J.A., Khan, M.A., Kaplan, R., and Rahman, M. (Institute of Physics Conference Series 137, Bristol, 1994) p. 211.Google Scholar
53.Purcell, K.F. and Kotz, J.C., Inorganic Chemistry (W.B. Saunders Company, Philadelphia, 1977).Google Scholar
54.Reinke, J., Muller, R., Feege, M., Greulich-Weber, S., and Spaeth, J-M., Mater. Sci. 143–147 (1994) p. 63.Google Scholar