Hostname: page-component-77c89778f8-m8s7h Total loading time: 0 Render date: 2024-07-21T04:40:01.016Z Has data issue: false hasContentIssue false

CVD Processing

Published online by Cambridge University Press:  29 November 2013

Get access

Extract

Various methods are used in functionally gradient materials technology to control the composition and structure of a composite.

The chemical vapor deposition (CVD) method yields a deposit with source gases by applying variou s forms of energy (heat, light, plasma, etc.) to the gases after they are introduced into a CVD reactor. Hydride, bromide, and chloride are generally used for source materials. By continually changing the mixture ratio of source gases or by controlling the CVD conditions such as deposition temperatures, gas pressure, and gas-flow rate, CVD permits relatively easy syntheses of various FGMs (to a maximum thickness on the order of a centimeter).

Type
Functionally Gradient Materials
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Hirai, T., in Processing of Ceramics (Materials Science and Technology, Vol. 17), edited by Brook, R.J. (VCH Verlagsgesellschaft mbH, Weinheim, Germany, 1994) to be published.Google Scholar
2.Sasaki, M. and Hirai, T., in Proceedings of the First International Symposium on Functionally Gradient Materials (FGM '90), edited by Yamanouchi, M., Koizumi, M., Hirai, T., and Shiota, I. (FGM Forum and the Society of Non-traditional Technology, Tokyo, 1990) p. 83.Google Scholar
3.Sohda, Y., Kude, Y., Uemura, S., Saitoh, T., Wakamatsu, Y., and Niino, M., Functionally Gradient Materials, edited by Holt, J.B., Koizumi, M., Hirai, T., and Munir, Z.A. (Am. Ceram. Soc., Ceram. Trans. 34, Westerville, OH, 1993) p. 125.Google Scholar
4.Suemitsu, T., Matsuzaki, Y., Fujioka, J., Uchida, M., Sohda, Y., Kude, Y., Uemura, S., Kuroda, Y., Ueda, S., and Moro, A., Functionally Gradient Materials, edited by Holt, J.B., Koizumi, M., Hirai, T., and Munir, Z.A. (Am. Ceram. Soc., Ceram. Trans. 34, Westerville, OH, 1993) p. 315.Google Scholar
5.Kowbel, W., in Proc. Third Int. Symp. Ceramic Materials and Components for Engines, edited by Tennery, V.J. (The American Ceramic Society, Westerville, OH, 1988), p. 290.Google Scholar
6.Kowbel, W., Functionally Gradient Materials, edited by Holt, J.B., Koizumi, M., Hirai, T., and Munir, Z.A. (Am. Ceram. Soc., Ceram. Trans. 34, Westerville, OH, 1993) p. 237.Google Scholar
7.Sasaki, M., Wang, Y., Hirano, T., and Hirai, T., J. Ceram. Soc. Jpn. Int. Ed. 97 (1989) p. 530.CrossRefGoogle Scholar
8.Uemura, S., Sohda, Y., and Kude, Y., in Proceedings of the First International Symposium on Functionally Gradient Materials (FGM '90), edited by Yamanouchi, M., Koizumi, M., Hirai, T., and Shiota, I. (FGM Forum and the Society of Non-traditional Technology, Tokyo, 1990) p. 237.Google Scholar
9.Araki, M., Sasaki, M., Kim, S., Suzuki, S., Nakamura, K., and Akiba, M., J. Nucl. Mater. (1994) in press.Google Scholar
10.Kawai, C., Wakamatsu, S., Sakagami, S., and Igarashi, T., in Proceedings of the First International Symposium on Functionally Gradient Materials (FGM '90), edited by Yamanouchi, M., Koizumi, M., Hirai, T., and Shiota, I. (FGM Forum and the Society of Non-traditional Technology, Tokyo, 1990) p. 77.Google Scholar
11.Sasaki, M., Hiratani, T., and Hirai, T., Functionally Gradient Materials, edited by Holt, J.B., Koizumi, M., Hirai, T., and Munir, Z.A. (Am. Ceram. Soc., Ceram. Trans. 34, Westerville, OH, 1993) p. 369.Google Scholar
12.Kawai, C., Teraki, J., Hirano, T., and Nomura, T., J. Ceram. Soc. Jpn. Int. Ed. 100 (1992) p. 1101.Google Scholar
13.Hirai, T. and Sasaki, M., Ceram. Int. 17 (1991) p. 275.CrossRefGoogle Scholar
14.Sasaki, M. and Hirai, T., J. Ceram. Soc. Jpn. 99 (1991) p. 1002.CrossRefGoogle Scholar
15.Kuroda, Y., Sato, M., Ueda, S., Niino, M., Suemitsu, T., and Kude, Y., in Proc. 18th Int. Symp. Space Technology and Science, edited by Hirosawa, H., Arakawa, Y., Onoda, J., Otsubo, K., Kawaguchi, J., Toki, K., Horikawa, Y., and Murata, M. (AGNE Kikaku Co., Ltd., Tokyo, 1992) p. 87.Google Scholar
16.Kawakami, S. and Nishizawa, J., Proc. IEEE 53 (1965) p. 2148.CrossRefGoogle Scholar