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Synthesis and Characterization of Copper-Iron Nitride Thin Films

Published online by Cambridge University Press:  14 December 2015

Hrishikesh Kamat ,
Xingwu Wang ,
James Parry ,
Yueling Qin  and
Hao Zeng
Hrishikesh Kamat*
Affiliation:
Alfred University, Alfred, NY 14802, U.S.A.
Xingwu Wang
Affiliation:
Alfred University, Alfred, NY 14802, U.S.A.
James Parry
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
Yueling Qin
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
Hao Zeng
Affiliation:
Department of Physics, University of Buffalo, Buffalo, NY 14260, U.S.A.
*
*(Email: hk12@alfred.edu)
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Abstract

Iron nitride thin films have potential applications in the biomedicine and energy. The magnetic properties of these films can be tuned by incorporating copper nitride. In this study, iron copper nitride thin films have been fabricated by magnetron sputtering technique either by co-sputtering iron nitride and copper nitride or by layer stacking of the materials. The structure, morphology and magnetic properties of the films have been studied by scanning electron microscopy, x-ray diffraction, x-ray reflectivity and vibrating sample magnetometry.

Keywords

thin filmmagnetic propertiesnitride
Type
Articles
Information
MRS Advances , Volume 1 , Issue 3: Nanomaterials and Synthesis , 2016 , pp. 203 - 208
Copyright
Copyright © Materials Research Society 2015 

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References

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