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Reactive Nanofluids for Tuning Resin Hardness

Published online by Cambridge University Press:  03 January 2019

John Texter*
Affiliation:
School of Engineering and Coatings Research Institute, Eastern Michigan University, Ypsilanti, MI 48197, USA
Zhiming Qiu
Affiliation:
School of Engineering and Coatings Research Institute, Eastern Michigan University, Ypsilanti, MI 48197, USA
Joe Byrom
Affiliation:
School of Engineering and Coatings Research Institute, Eastern Michigan University, Ypsilanti, MI 48197, USA
Rene Crombez
Affiliation:
School of Engineering and Coatings Research Institute, Eastern Michigan University, Ypsilanti, MI 48197, USA
*
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Abstract

Polyurea resins derived from tolyldiisocyante (TDI) and a reactive solvent-free nanofluid (NF-NH2) surface-decorated with propylamines can be tuned over three to five orders of magnitude in storage modulus (10 MPa to 10 GPa) and hardness modulus (6 kPa to 4 GPa) by varying weight fractions of components. The thermal properties of this NF-NH2 are similar to several other nanofluids reported using the same bulky anionic counterion that also imparts liquidity in the absence of any solvent. This tuning suggests applications ranging from opaque protective coatings to clearcoats to sealants to adhesives.

Type
Articles
Copyright
Copyright © Materials Research Society 2019 

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Footnotes

§

Present Address: College of Materials Science & Engineering, South China University of Technology, Guangzhou 510640, P.R. China

Present Address: Hentzen Coatings Inc., 6937 W Mill Rd, Milwaukee, WI 53218, USA

References

REFERENCES

Leone, A.M., Weatherly, S.C., Williams, M.E., Thorp, H.H., and Murray, R.W., J. Am. Chem. Soc. 123, 218222 (2001).CrossRefGoogle Scholar
Bourlinos, A.B., Raman, K., Herrera, R., Zhang, Q., Archer, L.A., and Giannelis, E.P., J. Am. Chem. Soc. 126, 1535815359 (2004).CrossRefGoogle Scholar
Bourlinos, A.B., Herrera, R., Chalkias, N., Jiang, D.D., Zhang, Q., Archer, L.A., and Giannelis, E.P., Adv. Mater. 17, 234237 (2005).CrossRefGoogle Scholar
Bourlinos, A.B., Chowdhury, S.R., Jiang, D.D., An, Y.U., Zhang, Q., Archer, L.A., and Giannelis, E.P., Small 1, 8082 (2005).CrossRefGoogle Scholar
Bourlinos, A.B., Chowdhury, S.R., Herrera, R., Jiang, D.D., Zhang, Q., Archer, L.A., and Giannelis, E.P., Adv. Funct. Mater. 15, 12851290 (2005).CrossRefGoogle Scholar
Texter, J., in Functional Organic Liquids - New-generation & Advanced Liquid Matter, edited by Nakanishi, T. (Wiley-VCH, Weinheim, 2019) in press.Google Scholar
Michinobu, T., Nakanishi, T., Hill, J.P., Funahashi, M., and Ariga, K., J. Am. Chem. Soc. 128, 1038410385 (2006).CrossRefGoogle Scholar
Nakanishi, T., Takahashi, H., Michinobu, T., Hill, J.P., Teranishi, T., and Ariga, K., Thin Solid Films 516, 24012406 (2008).CrossRefGoogle Scholar
Lintinen, K., Efimov, A., Hietala, S., Nagao, S., Jalkanen, P., , N. and Tkachenko, , Lemmetyinen, H., J. Polym. Sci. Part A: Polym. Chem. 46, 51945201 (2008).CrossRefGoogle Scholar
Shen, W., Crombez, R., Qiu, Z., and Texter, J., Presented at the 237th ACS National Meeting, Salt Lake City, UT, USA, paper No. COLL-020, 22 March 2009 (unpublished).Google Scholar
Texter, J., Qiu, Z., and Chojnowski, D., (2009) Presented at the European Coatings Congress, Nuremberg, Germany, Session 2. Nanotechnology, Paper 2.4, 30 March 2009.Google Scholar
Agarwal, P., Chopra, M., and Archer, L.A., Angew. Chem. Int. Ed. 50, 86708673 (2011).CrossRefGoogle Scholar
Texter, J., Qiu, Z., Crombez, R., Byrom, J., and Shen, W., Polymer Chem. 2, 17781787 (2011).CrossRefGoogle Scholar
Maniglia, R., Reed, K., and Texter, J., J. Colloid Interface Sci., 506, 346354 (2017).CrossRefGoogle Scholar
Texter, J., Qiu, Z., Crombez, R., and Shen, W., J. Poly. Sci. A. Poly. Sci. 51, 34393448 (2013).CrossRefGoogle Scholar
Ni, H., Skaja, A.D., and Soucek, M.D., Prog. Org. Coat., 40, 175184 (2000).CrossRefGoogle Scholar
Charropadhyay, D.K., Prasad, P.S.R., Sreedhar, B., and Raju, K.V.S.N., Prog. Org. Coat. 54, 296304 (2005).CrossRefGoogle Scholar
Image J – Image Processing and Analysis in Java. Available at: http://rsbweb.nih.gov/ij/, (accessed 13 November 2018).Google Scholar
Guillonneau, G., Kermouche, G., Bec, S., and Loubet, J.L., J. Mater. Res. 27, 25512560 (2012).CrossRefGoogle Scholar
Texter, J., Bian, K., Chojnowski, D., and Byrom, J., Angew. Chem. Int. Ed. 52, 2511–1515 (2013).CrossRefGoogle Scholar